SCHEMBL553858

SCHEMBL553858

Nc1ccc(Oc2ccc(-c3ccccc3)cc2)cc1

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 2/20 0.77
TDP1 Q9NUW8 4/20 0.71
CYP3A4 P08684 3/20 0.71
HSD17B10 Q99714 2/20 0.71
TAAR1 Q96RJ0 1/20 0.71
ALDH1A1 P00352 8/20 0.67
TSHR P16473 2/20 0.67
NCOA1 Q15788 1/20 0.62
NCOA3 Q9Y6Q9 1/20 0.62
MEN1 O00255 3/20 0.61
KMT2A Q03164 3/20 0.61
NPC1 O15118 3/20 0.61
RAB9A P51151 3/20 0.61
NLRP3 Q96P20 1/20 0.61
MAPT P10636 5/20 0.58
SMN1; SMN2 Q16637 3/20 0.58
MITF O75030 1/20 0.58
GAA P10253 1/20 0.58
GFER P55789 1/20 0.58
NLRP1 Q9C000 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4980978 1.00 MAOA (0.77) MAOATDP1CYP3A4HSD17B10TAAR1
Biphenyl-4-Amine SCHEMBL28258675 1.00 MAOA (0.77) MAOATDP1CYP3A4HSD17B10TAAR1
Biphenyl SCHEMBL20395915 1.00 MAOA (0.77) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL3786209 0.95 MAOA (0.86) MAOATDP1CYP3A4HSD17B10TAAR1
Benzidine SCHEMBL29023708 0.95 MAOA (0.86) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL3482671 0.90 ALDH1A1 (0.82) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL1271568 0.90 ALDH1A1 (0.82) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL3482529 0.90 ALDH1A1 (0.82) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL7144807 0.90 ALDH1A1 (0.82) MAOATDP1CYP3A4HSD17B10TAAR1
SCHEMBL12098596 0.90 ALDH1A1 (0.82) MAOATDP1CYP3A4HSD17B10TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118994001-A NOTCH signaling pathway inhibitors and their use in cancer treatment 塞莱斯蒂亚生物技术股份公司 2024-11-22 CN claimed
CN-113966324-A NOTCH signaling pathway inhibitors and their use in cancer treatment 塞莱斯蒂亚生物技术股份公司 2022-01-21 CN claimed
CN-106478949-A Polyetherimide heat shrinkage film matrix material and preparation method thereof 深圳市比克动力电池有限公司 2017-03-08 CN claimed
US-7459047-B2 Preparation of flexible copper foil/polyimide laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-02 US claimed
US-6468639-B2 PLATING RESISTANT AND PROTECTIVE INSULATING FILM IS ACHIEVED WITH A COATING MATERIAL OF A SINGLE TYPE OF INSULATING MATERIAL UBE INDUSTRIES, LTD. (JP) 2002-10-22 US claimed
US-5601905-A Laminate for insulation protection of circuit boards NIPPON STEEL CHEMICAL CO., LTD. (JP) 1997-02-11 US claimed
JP-9031327-A None JP disclosed
EP-3797991-B1 PREPREG AND PRODUCTION METHOD THEREFOR, SLIT TAPE PREPREG, CARBON FIBER-REINFORCED COMPOSITE MATERIAL TORAY INDUSTRIES (JP) 2025-10-29 EP disclosed
US-12448510-B2 Prepreg, method for producing same, and slit tape prepreg TORAY INDUSTRIES, INC. (JP) 2025-10-21 US disclosed
EP-3995536-B1 PREPREG AND FIBER-REINFORCED COMPOSITE MATERIAL TORAY INDUSTRIES (JP) 2025-06-18 EP disclosed
CN-118994001-A NOTCH signaling pathway inhibitors and their use in cancer treatment 塞莱斯蒂亚生物技术股份公司 2024-11-22 CN disclosed
CN-113966324-B NOTCH signaling pathway inhibitors and their use in cancer treatment 塞莱斯蒂亚生物技术股份公司 2024-09-03 CN disclosed
CN-118355055-A Isocyanate modified polyimide resin, resin composition containing the same, and cured product thereof 日本化药株式会社 2024-07-16 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
US-5348835-A Without photoresist KABUSHIKI KAISHA TOSHIBA (JP) 1994-09-20 US disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed
US-5194579-A Humidity and heat resistance; coatings for semiconductors, insulating films for wiring HITACHI, LTD. (JP) 1993-03-16 US disclosed
EP-0478321-A1 Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern KABUSHIKI KAISHA TOSHIBA (JP) 1992-04-01 EP disclosed
US-4521623-A 2,2-Bis[(2-halo-4-aminophenoxy)phenyl]-hexafluoropropane TRW INC. (US) 1985-06-04 US disclosed
US-4477648-A FOR AIRCRAFT ENGINES TRW INC. (US) 1984-10-16 US disclosed