SCHEMBL554571

SCHEMBL554571

Cc1c2c(c(C)c3c1=c1ccccc1=N3)=c1ccccc1=N2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL191345 0.70 ALDH1A1 (0.30)
SCHEMBL18862023 0.70
SCHEMBL9959990 0.69
SCHEMBL2914843 0.68 TGM2 (0.30)
SCHEMBL528426 0.68 PADI4 (0.31)
SCHEMBL2074994 0.67 KDR (0.32)
SCHEMBL4515373 0.64 ALDH1A1 (0.32)
SCHEMBL7412927 0.64 LMNA (0.33)
SCHEMBL17766689 0.64
SCHEMBL211306 0.61 TSHR (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9184391-B2 Compound having indolocarbazole moiety and divalent linkage XEROX CORPORATION (US) 2015-11-10 US disclosed
US-20140148567-A1 COMPOUND HAVING INDOLOCARBAZOLE MOIETY AND DIVALENT LINKAGE XEROX CORPORATION (US) 2014-05-29 US disclosed
US-20140088313-A1 SUBSTITUTED INDOLOCARBAZOLES XEROX CORPORATION (US) 2014-03-27 US disclosed
US-8673959-B2 Polymer having indolocarbazole moiety and divalent linkage XEROX CORPORATION (US) 2014-03-18 US disclosed
US-8609867-B2 Substituted indolocarbazoles XEROX CORPORATION (US) 2013-12-17 US disclosed
EP-1671998-B1 Process to form compound with indolocarbazole moieties XEROX CORP (US) 2013-02-20 EP disclosed
US-20120157689-A1 SUBSTITUTED INDOLOCARBAZOLES XEROX CORPORATION (US) 2012-06-21 US disclosed
US-8110690-B2 Substituted indolocarbazoles XEROX CORPORATION (US) 2012-02-07 US disclosed
US-8003807-B2 organic thin film transistor with a semiconductor layer including the small molecule having didodecylindolo[3,2-b]carbazole groups XEROX CORPORATION (US) 2011-08-23 US disclosed
US-7868186-B2 Device containing polymer having indolocarbazole- repeat unit and divalent linkage XEROX CORPORATION (US) 2011-01-11 US disclosed
US-20070112167-A1 Device containing compound having indolocarbazole moiety and divalent linkage XEROX CORPORATION 2007-05-17 US disclosed
US-20070112172-A1 Compound having indolocarbazole moiety and divalent linkage XEROX CORPORATION 2007-05-17 US disclosed
US-7173140-B2 Process to form compound with indolocarbazole moieties XEROX CORPORATION (US) 2007-02-06 US disclosed
US-20060214155-A1 Compound with indolocarbazole moieties and devices containing such compound XEROX CORPORATION 2006-09-28 US disclosed
EP-1672713-A1 Compound with indolocarbazole moieties and electronic devices containing such compound Xerox Corporation (US) 2006-06-21 EP disclosed
EP-1671998-A2 Process to form compound with indolocarbazole moieties Xerox Corporation (US) 2006-06-21 EP disclosed
US-20060124923-A1 Thin film transistors including indolocarbazoles XEROX CORPORATION 2006-06-15 US disclosed
US-20060124921-A1 Compound with indolocarbazole moieties and devices containing such compound XEROX CORPORATION (US) 2006-06-15 US disclosed
US-20060125009-A1 Thin film transistors including indolocarbazoles XEROX CORPORATION 2006-06-15 US disclosed
US-20060128969-A1 Process to form compound with indolocarbazole moieties XEROX CORPORATION 2006-06-15 US disclosed