SCHEMBL5547692

SCHEMBL5547692

O=[C]OCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA9 Q16790 2/20 0.42
ALDH1A1 P00352 5/20 0.42
GRIN2D O15399 4/20 0.41
GRIN3B O60391 4/20 0.41
GRIN1 Q05586 4/20 0.41
GRIN2A Q12879 4/20 0.41
GRIN2B Q13224 4/20 0.41
GRIN2C Q14957 4/20 0.41
GRIN3A Q8TCU5 4/20 0.41
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
TSHR P16473 1/20 0.36
EPHX2 P34913 1/20 0.34
HSD17B10 Q99714 1/20 0.33
BPTF Q12830 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5539063 0.78 MEN1 (0.49) CA12CA1CA2CA9ALDH1A1
SCHEMBL5539320 0.75 GRIN2D (0.48) CA12CA1CA2CA9ALDH1A1
SCHEMBL5545712 0.74 GRIN2D (0.50) CA12CA1CA2CA9ALDH1A1
SCHEMBL5547326 0.72 GRIN2D (0.48) CA12CA1CA2CA9ALDH1A1
SCHEMBL5543156 0.72 GRIN2D (0.48) CA12CA1CA2CA9ALDH1A1
SCHEMBL5095244 0.72 GRIN2D (0.50) CA12CA1CA2CA9ALDH1A1
SCHEMBL17024368 0.71
SCHEMBL11907650 0.70 NPSR1 (0.36) ALDH1A1MEN1KMT2A
SCHEMBL20612578 0.69 CA12 (0.47) CA12CA1CA2CA9ALDH1A1
SCHEMBL197070 0.69 GRIN2D (0.48) CA12CA1CA2CA9ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230341772-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2023-10-26 US disclosed
US-11747725-B2 Radiation-sensitive resin composition and method for forming resist pattern JSR CORPORATION (JP) 2023-09-05 US disclosed
US-20230104260-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2023-04-06 US disclosed
US-20200401043-A1 PATTERN FORMING METHOD AND DEVELOPER JSR CORPORATION (JP) 2020-12-24 US disclosed
WO-2020241277-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND JSR株式会社 2020-12-03 WO disclosed
CN-110869024-A Multi-biological agents and methods of use thereof 旗舰创业创新五公司 2020-03-06 CN disclosed
US-20190285983-A1 RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2019-09-19 US disclosed
US-10234759-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2019-03-19 US disclosed
US-20180299773-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2018-10-18 US disclosed
US-20160131976-A1 RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-12 US disclosed
EP-2697247-A1 METHOD FOR THE RAPID CHEMOENZYMATIC GLYCOSYLATION OF CONJUGATES BETWEEN PEPTIDES AND HYDROPHILIC POLYMERS Universität Wien (AT) 2014-02-19 EP disclosed
EP-2570418-A2 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles compound OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2013-03-20 EP disclosed
EP-1555267-B1 2,3-DIHYDRO-6-NITROIMIDAZO[2,1-b]OXAZOLES OTSUKA PHARMA CO LTD (JP) 2013-01-16 EP disclosed
WO-2012139777-A1 METHOD FOR THE RAPID CHEMOENZYMATIC GLYCOSYLATION OF CONJUGATES BETWEEN PEPTIDES AND HYDROPHILIC POLYMERS UNIVERSITÄT ZU KÖLN (DE) 2012-10-18 WO disclosed
US-7262212-B2 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2007-08-28 US disclosed
US-20060094767-A1 2,3-Dihydro-6-nitroimidazo[2,1-b]oxazoles OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2006-05-04 US disclosed
EP-1555267-A1 2,3-DIHYDRO-6-NITROIMIDAZO 2,1-b OXAZOLES OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2005-07-20 EP disclosed
US-5643869-A Pipecolic acid-containing peptolides, their preparation and pharmaceutical compositions containing them SANDOZ LTD. (CH) 1997-07-01 US disclosed
EP-0360760-B1 Pipecolic acid containing cyclopeptolides, their preparation and pharmaceutical compositions containing them SANDOZ AG (CH) 1995-02-15 EP disclosed
EP-0360760-A2 Pipecolic acid containing cyclopeptolides, their preparation and pharmaceutical compositions containing them SANDOZ AG (CH) 1990-03-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10234759-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern AFF1, MACF1, RER1 CA12 2008/4885CA1 722/4885CA2 3423/4885
US-20230341772-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN RER1, XRCC5, F12 CA12 1254/4885CA1 251/4885CA2 1603/4885
US-20060094767-A1 2,3-Dihydro-6-nitroimidazo[2,1-b]oxazoles NR2C2, NR4A3, NR4A2 CA12 1998/4885CA1 3493/4885CA2 1853/4885
US-20190285983-A1 RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN RER1, RFT1, RAD51 CA12 1997/4885CA1 699/4885CA2 1648/4885
US-11747725-B2 Radiation-sensitive resin composition and method for forming resist pattern RER1, AFF1, RAD51 CA12 1235/4885CA1 456/4885CA2 2296/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.