SCHEMBL5563702

SCHEMBL5563702

c1csc(-n2ncc3ccccc32)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP11B1 P15538 1/20 0.39
CYP11B2 P19099 1/20 0.39
MGAM O43451 1/20 0.39
GAA P10253 1/20 0.39
SI P14410 1/20 0.39
MGAM2 Q2M2H8 1/20 0.39
RECQL P46063 1/20 0.39
KDM4E B2RXH2 2/20 0.38
MKNK1 Q9BUB5 2/20 0.36
MKNK2 Q9HBH9 2/20 0.36
PDE10A Q9Y233 7/20 0.36
LRRK2 Q5S007 1/20 0.36
CYP1A2 P05177 1/20 0.36
NPC1 O15118 1/20 0.35
ALDH1A1 P00352 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
KMO O15229 1/20 0.35
GRM4 Q14833 1/20 0.34
MAPK8 P45983 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5780198 0.76 CYP11B2 (0.47) CYP11B1CYP11B2GAAKDM4ELRRK2
SCHEMBL6998415 0.75 SRPK1 (0.44) KDM4E
SCHEMBL4888542 0.72 CYP17A1 (0.50) CYP11B1CYP11B2MGAMGAASI
SCHEMBL16241787 0.72 CYP11B1 (0.40) CYP11B1CYP11B2MGAMGAASI
SCHEMBL29249089 0.72 FGFR1 (0.33) CYP1A2NPC1RAB9AGRM4
SCHEMBL16796145 0.72 MKNK1 (0.51) CYP11B1CYP11B2RECQLKDM4EMKNK1
SCHEMBL729956 0.71 KDM4E (0.56) CYP11B1CYP11B2MGAMGAASI
SCHEMBL13052911 0.71 CYP11B2 (0.55) CYP11B1CYP11B2MGAMGAASI
SCHEMBL30270004 0.71 KDM4E (0.56) CYP11B1CYP11B2MGAMGAASI
SCHEMBL29741044 0.70 CYP11B2 (0.51) CYP11B1CYP11B2MGAMGAASI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108885396-B Positive working photosensitive material 默克专利有限公司 2023-03-24 CN claimed
US-20220342308-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIALS MERCK PATENT GMBH (DE) 2022-10-27 US claimed
CN-109844641-B Environmentally stable thick film chemically amplified resists 默克专利有限公司 2022-10-11 CN claimed
US-11385543-B2 Enviromentally stable, thick film, chemically amplified resist MERCK PATENT GMBH (DE) 2022-07-12 US claimed
EP-3847506-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL Merck Patent GmbH (DE) 2021-07-14 EP claimed
CN-112654928-A Positive photosensitive material 默克专利股份有限公司 2021-04-13 CN claimed
US-10976662-B2 Positive working photosensitive material MERCK PATENT GMBH (DE) 2021-04-13 US claimed
EP-3497519-B1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST MERCK PATENT GMBH (DE) 2020-11-25 EP claimed
US-20200183278-A1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2020-06-11 US claimed
EP-3446180-B1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-04-01 EP claimed
EP-2929397-B1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-03-18 EP claimed
EP-3497519-A1 ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST Ridgefield Acquisition (LU) 2019-06-19 EP claimed
EP-2929397-A2 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2015-10-14 EP claimed
WO-2014086846-A2 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2014-06-12 WO claimed
US-20240045333-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROFILE AND DEPTH OF FOCUS (DOF) MERCK PATENT GMBH (DE) 2024-02-08 US disclosed
US-11822242-B2 DNQ-type photoresist composition including alkali-soluble acrylic resins MERCK PATENT GMBH (DE) 2023-11-21 US disclosed
EP-4275093-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROFILE AND DEPTH OF FOCUS (DOF) Merck Patent GmbH (DE) 2023-11-15 EP disclosed
EP-1646382-A2 COMPOUNDS, COMPOSITIONS AND METHODS HIF BIO INC. (US) 2006-04-19 EP disclosed
US-20050187276-A1 Compounds, compositions and methods BIZBIOTECH CO., LTD. (KR) 2005-08-25 US disclosed
WO-2005030121-A2 COMPOUNDS, COMPOSITIONS AND METHODS HIF BIO, INC. (US) 2005-04-07 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050187276-A1 Compounds, compositions and methods HIF1A, HIF1AN, EGLN3 CYP11B1 402/4885CYP11B2 564/4885MGAM 4451/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.