SCHEMBL556372

SCHEMBL556372

CC1CCC(NC(=O)CC(CC(=O)NC2CCC(C)CC2)C(=O)NC2CCC(C)CC2)CC1

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.46
KMT2A Q03164 3/20 0.44
GAA P10253 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
ALDH1A1 P00352 2/20 0.42
ADRA2A P08913 1/20 0.42
LMNA P02545 2/20 0.40
MEN1 O00255 1/20 0.40
RAB9A P51151 5/20 0.40
NPC1 O15118 3/20 0.40
MAPK1 P28482 1/20 0.40
CYP3A4 P08684 1/20 0.39
HPGD P15428 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL556878 0.86 KMT2A (0.47) EPHX1KMT2AGAASMN1; SMN2LMNA
SCHEMBL2450410 0.84 CYP3A4 (0.41) EPHX1KMT2ASMN1; SMN2LMNARAB9A
SCHEMBL2450175 0.83 KMT2A (0.42) EPHX1KMT2ASMN1; SMN2RAB9ACYP3A4
SCHEMBL2454792 0.83 KMT2A (0.45) EPHX1KMT2ASMN1; SMN2ALDH1A1MEN1
Stearic Acid SCHEMBL3696590 0.82 GNAI3 (0.46) KMT2AALDH1A1MEN1HPGD
Stearic Acid SCHEMBL3690322 0.82 GNAI3 (0.43) KMT2AALDH1A1MEN1HPGD
Stearic Acid SCHEMBL3694415 0.82 GNAI3 (0.43) KMT2AALDH1A1MEN1HPGD
Stearic Acid SCHEMBL3689753 0.82 GNAI3 (0.43) KMT2AALDH1A1MEN1HPGD
Stearic Acid SCHEMBL3686452 0.82 GNAI3 (0.43) KMT2AALDH1A1MEN1HPGD
SCHEMBL15014614 0.81 EPHX1 (0.48) EPHX1KMT2AGAASMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115556441-B Decorative film and method for producing decorative molded article using same 日本聚丙烯株式会社 2025-04-11 CN disclosed
CN-115556446-A Decorative film and method for producing decorative molded body using same 日本聚丙烯株式会社 2023-01-03 CN disclosed
CN-115556441-A Decorative film and method for producing decorative molded body using same 日本聚丙烯株式会社 2023-01-03 CN disclosed
US-20200384678-A1 DECORATIVE FILM AND METHOD FOR MANUFACTURING DECORATIVE MOLDED ARTICLE USING SAME JAPAN POLYPROPYLENE CORPORATION (JP) 2020-12-10 US disclosed
EP-3715092-A1 DECORATIVE FILM AND METHOD FOR MANUFACTURING DECORATIVE MOLDED ARTICLE USING SAME Japan Polypropylene Corporation (JP) 2020-09-30 EP disclosed
EP-2862883-B1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORP (JP) 2019-09-25 EP disclosed
US-9243127-B2 Method for producing nucleator masterbatch ADEKA CORPORATION (JP) 2016-01-26 US disclosed
US-20150152248-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH ADEKA CORPORATION (JP) 2015-06-04 US disclosed
US-9023921-B2 Method for inhibiting crystal growth rate of amide compound and method for producing molded article of polyolefin-based resin NEW JAPAN CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
EP-2862883-A1 METHOD FOR PRODUCING NUCLEATOR MASTERBATCH Adeka Corporation (JP) 2015-04-22 EP disclosed
US-7745661-B2 Process for producing tricarboxylic acid tris (alkyl-substituted cyclohexylamide) NEW JAPAN CHEMICAL CO., LTD. (JP) 2010-06-29 US disclosed
US-7723413-B2 Method and composition for control of crystallization rate of polyolefin resin, resin composition and resin molding NEW JAPAN CHEMICAL CO., LTD. (JP) 2010-05-25 US disclosed
EP-1715000-B1 METHOD AND COMPOSITION FOR CONTROL OF CRYSTALLIZATION RATE OF POLYOLEFIN RESIN, RESIN COMPOSITION AND RESIN MOLDING NEW JAPAN CHEM CO LTD (JP) 2010-03-10 EP disclosed
US-20100016491-A1 NOVEL POLYOLEFIN RESIN COMPOSITION AND MOLDED RESIN OBTAINED THEREFROM NEW JAPAN CHEMICAL CO., LTD. (JP) 2010-01-21 US disclosed
EP-2096137-A1 NOVEL POLYOLEFIN RESIN COMPOSITION AND MOLDED RESIN OBTAINED THEREFROM New Japan Chemical Co., Ltd. (JP) 2009-09-02 EP disclosed
EP-2083045-A1 Method and composition for control of crystallization rate of polyolefin resin, resin composition and resin molding New Japan Chemical Co., Ltd. (JP) 2009-07-29 EP disclosed
US-20090069599-A1 PROCESS FOR PRODUCING TRICARBOXYLIC ACID TRIS (ALKYL-SUBSTITUTED CYCLOHEXYLAMIDE) NEW JAPAN CHEMICAL CO., LTD., (JP) 2009-03-12 US disclosed
EP-1867630-A1 PROCESS FOR PRODUCING TRICARBOXYLIC ACID TRIS(ALKYL-SUBSTITUTED CYCLOHEXYLAMIDE) NEW JAPAN CHEMICAL CO.,LTD. (JP) 2007-12-19 EP disclosed
US-20070142514-A1 Method and composition for control of crystallization rate of polyolefin resin, resin composition and resin molding NEW JAPAN CHEMICAL CO., LTD. (JP) 2007-06-21 US disclosed
EP-1715000-A1 METHOD AND COMPOSITION FOR CONTROL OF CRYSTALLIZATION RATE OF POLYOLEFIN RESIN, RESIN COMPOSITION AND RESIN MOLDING NEW JAPAN CHEMICAL CO.,LTD. (JP) 2006-10-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090069599-A1 PROCESS FOR PRODUCING TRICARBOXYLIC ACID TRIS (ALKYL-SUBSTITUTED CYCLOHEXYLAMIDE) ACMSD, CPS1, COASY EPHX1 3985/4885KMT2A 3082/4885GAA 796/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.