SCHEMBL5570294

SCHEMBL5570294

C(#CCOc1cccnc1)C=CC#CCOc1cccnc1

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 7/20 0.47
CHRNA4 P43681 7/20 0.47
CHRNA3 P32297 2/20 0.43
CHRNA7 P36544 2/20 0.43
CHRNA1 P02708 1/20 0.43
CHRNG P07510 1/20 0.43
CHRNB1 P11230 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRND Q07001 1/20 0.43
LMNA P02545 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CTSL P07711 1/20 0.41
CTSS P25774 1/20 0.41
CTSK P43235 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8013634 0.92 CHRNB2 (0.45) CHRNB2CHRNA4CTSLCTSSCTSK
SCHEMBL11478353 0.81 CHRNB2 (0.49) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
SCHEMBL2004098 0.77 CHRNB2 (0.54) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
SCHEMBL4808799 0.77 CHRNB2 (0.51) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
SCHEMBL7305175 0.77 CHRNB2 (0.51) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
SCHEMBL105590 0.77 CHRNB2 (0.51) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
Formaldehyde SCHEMBL28730871 0.72 CHRNB2 (0.47) CHRNB2CHRNA4CHRNA3CHRNA7CHRNA1
SCHEMBL9307305 0.71 KCNH2 (0.44)
SCHEMBL9307301 0.71 KCNH2 (0.44)
SCHEMBL31673233 0.71 CYP2A6 (0.57) CHRNB2CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7211603-B1 Enediyne compounds and methods related thereto INDIANA UNIVERSITY RESEARCH AND TECHNOLOGY CORPORATION (US) 2007-05-01 US disclosed
US-6987132-B1 Enediyne compounds and methods related thereto ADVANCED RESEARCH AND TECHNOLOGY INSTITUTE, INC. (US) 2006-01-17 US disclosed
US-6514995-B1 Metal complex is capable of forming a benzenoid diradical under physiological conditions and/or under photothermal conditions ADVANCED RESEARCH AND TECHNOLOGY INSTITUTE, INC. 2003-02-04 US disclosed