Propionic Acid

Propionic Acid

SCHEMBL5571708

CCC(=O)O.CCCC(C)C(C)(C)N

nearest known ligand 0.42

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.42
HDAC1 Q13547 2/20 0.38
HDAC2 Q92769 2/20 0.38
CHRM1 P11229 1/20 0.38
AKR1A1 P14550 1/20 0.38
CHRM3 P20309 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
ADRA1A P35348 1/20 0.38
HRH1 P35367 1/20 0.38
DRD3 P35462 1/20 0.38
SLC6A3 Q01959 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
ALDH1A1 P00352 2/20 0.36
GABRP O00591 2/20 0.35
GABRD O14764 2/20 0.35
GABRA1 P14867 2/20 0.35
GABRB1 P18505 2/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL5574320 0.89 CHRM1 (0.39) HDAC1HDAC2CHRM1AKR1A1CHRM3
Butyric Acid SCHEMBL5573622 0.88 HDAC1 (0.50) FFAR3HDAC1HDAC2CHRM1AKR1A1
Propionic Acid SCHEMBL5574450 0.88 CA2 (0.44) FFAR3SLC1A2SLC1A1SLC1A3GRIK1
SCHEMBL5574369 0.88 CHRM1 (0.43) HDAC1HDAC2CHRM1AKR1A1CHRM3
Pivalate SCHEMBL5574389 0.88 CHRM1 (0.38) HDAC1HDAC2CHRM1AKR1A1CHRM3
Propionic Acid SCHEMBL5571719 0.86 GRIK1 (0.43) SLC1A2SLC1A1GRIK1GRIK2CA1
Lactic Acid SCHEMBL5574298 0.86 TP53 (0.44) HDAC1HDAC2CHRM1AKR1A1CHRM3
Propionic Acid SCHEMBL5575012 0.85 GPR84 (0.46) ALDH1A1SLC1A2SLC1A1GRIK1GRIK2
Propionic Acid SCHEMBL5571637 0.85 GPR84 (0.46) ALDH1A1SLC1A2SLC1A1GRIK1GRIK2
Propionic Acid SCHEMBL5574991 0.85 GPR84 (0.46) ALDH1A1SLC1A2SLC1A1GRIK1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed