Propionic Acid

Propionic Acid

SCHEMBL5572299

CCC(=O)[O-].CCCC[N+](C)(C)C

nearest known ligand 0.52

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 6/20 0.50
CA1 P00915 1/20 0.46
APAF1 O14727 1/20 0.46
HSP90AA1 P07900 1/20 0.46
RAD52 P43351 1/20 0.46
ACHE P22303 1/20 0.44
BBOX1 O75936 2/20 0.43
FFAR3 O14843 1/20 0.40
HDAC3 O15379 1/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
CES2 O00748 1/20 0.40
CES1 P23141 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propionic Acid SCHEMBL5571699 0.93 DNM1 (0.61) DNM1CA1APAF1HSP90AA1RAD52
Cetrimonium SCHEMBL31516838 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL5574986 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL5575004 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL5571634 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL5571712 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL5574446 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Propionic Acid SCHEMBL8149435 0.91 DNM1 (0.65) DNM1APAF1HSP90AA1RAD52ACHE
Bicarbonate SCHEMBL2279601 0.90 DNM1 (0.55) DNM1CA1APAF1HSP90AA1RAD52
Acetic Acid SCHEMBL5574141 0.88 DNM1 (0.52) DNM1CA1APAF1HSP90AA1RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed