SCHEMBL557306

SCHEMBL557306

CO[Si](C)(C)CCCCCCCC[Si](C)(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL931332 1.00
SCHEMBL2956125 1.00
SCHEMBL9785099 1.00
SCHEMBL3229729 1.00
SCHEMBL703801 0.97
SCHEMBL28368573 0.91 MGAM (0.31)
SCHEMBL28368189 0.91 MGAM (0.31)
SCHEMBL648313 0.90
SCHEMBL6054003 0.89 TSHR (0.42)
SCHEMBL5843473 0.89 TSHR (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260109868-A1 COATED ARTICLES WITH A SURFACE-MODIFYING LAYER AND METHODS OF MAKING THE SAME CORNING INC (US) 2026-04-23 US disclosed
EP-4570877-A1 SURFACE TREATMENT AGENT DAIKIN INDUSTRIES, LTD. (JP) 2025-06-18 EP disclosed
CN-119698451-A Surface treating agent 大金工业株式会社 2025-03-25 CN disclosed
EP-4509551-A1 SURFACE TREATMENT AGENT DAIKIN INDUSTRIES, LTD. (JP) 2025-02-19 EP disclosed
WO-2025028568-A1 SURFACE TREATMENT AGENT ダイキン工業株式会社 2025-02-06 WO disclosed
CN-114846377-B Optical laminate and image display device 住友化学株式会社 2024-12-03 CN disclosed
CN-119053645-A Surface treating agent 大金工业株式会社 2024-11-29 CN disclosed
CN-114846374-B Optical laminate and image display device 住友化学株式会社 2024-11-01 CN disclosed
CN-114450375-B Adhesive composition 住友化学株式会社 2024-10-25 CN disclosed
WO-2024150783-A1 ADHESIVE COMPOSITION, ADHESIVE LAYER, OPTICAL FILM WITH ADHESIVE LAYER, AND DISPLAY DEVICE 住友化学株式会社 2024-07-18 WO disclosed
CN-114502680-A Adhesive composition 住友化学株式会社 2022-05-13 CN disclosed
CN-114450375-A Adhesive composition 住友化学株式会社 2022-05-06 CN disclosed
US-10995268-B2 Etching composition effective to selectively wet etch a silicon nitride film LTCAM CO., LTD. (KR) 2021-05-04 US disclosed
CN-110551503-B Composition for wet etching silicon nitride LTCAM株式会社 2021-04-16 CN disclosed
CN-110551503-A Composition for wet etching silicon nitride LTCAM CO LTD 2019-12-10 CN disclosed
US-9074032-B2 Membranes based on polyvinyl alcohol WACKER CHEMIE AG (DE) 2015-07-07 US disclosed
EP-2414411-B1 MEMBRANES BASED ON POLYVINYL ALCOHOL WACKER CHEMIE AG (DE) 2013-02-20 EP disclosed
US-20120031843-A1 Membranes based on polyvinyl alcohol WACKER CHEMIE AG (DE) 2012-02-09 US disclosed
EP-2163664-A1 Method for depositing si-containing film, insulator film, and semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-03-17 EP disclosed
US-20100061915-A1 METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 US disclosed