SCHEMBL5575071

SCHEMBL5575071

CC(C)C(=O)O.CCC(C)C(C)(C)N

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.36
CA2 P00918 1/20 0.35
MAPK1 P28482 1/20 0.35
SLC1A3 P43003 2/20 0.34
SLC1A2 P43004 2/20 0.34
SLC1A1 P43005 2/20 0.34
GABRR1 P24046 2/20 0.33
SLC7A5 Q01650 2/20 0.33
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
PTGS1 P23219 1/20 0.33
TP53 P04637 1/20 0.32
GRIK1 P39086 1/20 0.31
GRIA4 P48058 1/20 0.31
GRIK3 Q13003 1/20 0.31
GRIK5 Q16478 1/20 0.31
CHRM1 P11229 1/20 0.31
AKR1A1 P14550 1/20 0.31
CHRM3 P20309 1/20 0.31
HTR2A P28223 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lactic Acid SCHEMBL5574377 0.89 TP53 (0.48) KIF11CA2MAPK1SLC1A3SLC1A2
Acetic Acid SCHEMBL5574143 0.88 KIF11 (0.33) KIF11CA2MAPK1SLC1A3SLC1A2
Pivalate SCHEMBL4922269 0.86 ALDH1A1 (0.33) KIF11CA2MAPK1SLC1A3SLC1A2
Propionic Acid SCHEMBL5572300 0.86 FFAR3 (0.46) KIF11CA2MAPK1ALDH1A1GRIK1
SCHEMBL5574369 0.83 CHRM1 (0.43) CA2MAPK1SLC1A3SLC1A2SLC1A1
SCHEMBL18831873 0.83
SCHEMBL231913 0.83
Methacrylic Acid SCHEMBL4928144 0.81 TDP1 (0.32) KIF11TDP1
Acrylic Acid SCHEMBL4928214 0.81 LMNA (0.40) KIF11ALDH1A1SLC6A3
Butyric Acid SCHEMBL5574238 0.81 FFAR3 (0.52) ALDH1A1HDAC1HDAC2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed