Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.33 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.33 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL19812899 | 0.89 | CYP2C9 (0.36) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Propanol SCHEMBL4712985 | 0.88 | ALDH1A1 (0.41) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Alcohol SCHEMBL48558 | 0.87 | ALDH1A1 (0.55) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Propanol SCHEMBL11584437 | 0.85 | ALDH1A1 (0.39) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Propanol SCHEMBL2016031 | 0.85 | ALDH1A1 (0.39) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| 1,4-Butanediol SCHEMBL27858593 | 0.85 | SMN1; SMN2 (0.53) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Alcohol SCHEMBL18837465 | 0.83 | ALDH1A1 (0.50) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Alcohol SCHEMBL11582714 | 0.83 | ALDH1A1 (0.50) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Alcohol SCHEMBL974601 | 0.83 | ALDH1A1 (0.50) | TSHRHSD17B10CYP2C9HPGDMAPK1 | |
| Methyl Alcohol SCHEMBL341831 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-117946812-A | Cleaning composition | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-117761977-A | Corrosion-resistant alkaline developer | 国科天骥(滨州)新材料有限责任公司 | 2024-03-26 | — | — | CN | claimed |
| CN-116661263-A | Low-aluminum corrosion developer and preparation method and application thereof | 艾森半导体材料(南通)有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-110777381-B | Composition for TiN hardmask removal and etch residue cleaning | 弗萨姆材料美国有限责任公司 | 2022-10-04 | — | — | CN | claimed |
| CN-113589662-B | Composition, stripping liquid, application of stripping liquid in stripping of photoresist or photoresist residues and stripping method | 浙江奥首材料科技有限公司 | 2022-07-12 | — | — | CN | claimed |
| CN-113589662-A | Composition, stripping liquid, application of stripping liquid in stripping of photoresist or photoresist residues and stripping method | 浙江奥首材料科技有限公司 | 2021-11-02 | — | — | CN | claimed |
| CN-113287187-A | Hafnium oxide corrosion inhibitors | 弗萨姆材料美国有限责任公司 | 2021-08-20 | — | — | CN | claimed |
| EP-3004287-B1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | ENTEGRIS INC (US) | 2021-08-18 | — | — | EP | claimed |
| EP-2798669-B1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | ENTEGRIS INC (US) | 2021-03-31 | — | — | EP | claimed |
| EP-3004287-A1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | Advanced Technology Materials, Inc. (US) | 2016-04-13 | — | — | EP | claimed |
| CN-105492576-A | Composition and method for selectively etching titanium nitride | ADVANCED TECH MATERIALS | 2016-04-13 | — | — | CN | claimed |
| WO-2015031620-A1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-03-05 | — | — | WO | claimed |
| US-20150045277-A1 | POST-CMP FORMULATION HAVING IMPROVED BARRIER LAYER COMPATIBILITY AND CLEANING PERFORMANCE | ENTEGRIS, INC. (US) | 2015-02-12 | — | — | US | claimed |
| CN-104334706-A | Post-CMP formulation having improved barrier layer compatibility and cleaning performance | ENTEGRIS INC | 2015-02-04 | — | — | CN | claimed |
| EP-2828371-A1 | POST-CMP FORMULATION HAVING IMPROVED BARRIER LAYER COMPATIBILITY AND CLEANING PERFORMANCE | Entegris, Inc. (US) | 2015-01-28 | — | — | EP | claimed |
| WO-2014197808-A1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2014-12-11 | — | — | WO | claimed |
| EP-2798669-A1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | Entegris, Inc. (US) | 2014-11-05 | — | — | EP | claimed |
| WO-2013142250-A1 | POST-CMP FORMULATION HAVING IMPROVED BARRIER LAYER COMPATIBILITY AND CLEANING PERFORMANCE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-09-26 | — | — | WO | claimed |
| WO-2013101907-A1 | COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-07-04 | — | — | WO | claimed |