SCHEMBL5583438

SCHEMBL5583438

O=[N+]([O-])c1ccccc1C(O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.56
TSHR P16473 1/20 0.53
ALDH1A1 P00352 4/20 0.50
TDP1 Q9NUW8 3/20 0.44
GPR35 Q9HC97 1/20 0.44
HSD17B10 Q99714 1/20 0.42
MAPT P10636 2/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
CYP2C9 P11712 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
SLC6A3 Q01959 1/20 0.42
KCNH2 Q12809 1/20 0.42
CRHBP P24387 1/20 0.41
CRHR2 Q13324 1/20 0.41
MAPK1 P28482 1/20 0.41
CASP7 P55210 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31633570 1.00 CYP1A2 (0.56) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL506668 0.88 CYP1A2 (0.58) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL9489211 0.88 GAA (0.47) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL23458474 0.86 CYP1A2 (0.46) CYP1A2TSHRALDH1A1GPR35HSD17B10
SCHEMBL31067424 0.84 ALDH1A1 (0.45) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL17064547 0.84 ALDH1A1 (0.45) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL4622229 0.84 ALDH1A1 (0.45) CYP1A2TSHRALDH1A1TDP1GPR35
Potassium Ion SCHEMBL8055305 0.82 ALDH1A1 (0.44) CYP1A2TSHRALDH1A1TDP1GPR35
SCHEMBL5583370 0.82 ALDH1A1 (0.52) CYP1A2ALDH1A1TDP1MAPTKMT2A
SCHEMBL6940420 0.82 GAA (0.57) CYP1A2TSHRALDH1A1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0277555-B1 COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES BASF Aktiengesellschaft (DE) 1992-04-08 EP claimed
US-4808682-A BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1989-02-28 US claimed
EP-0277555-A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices BASF Aktiengesellschaft (DE) 1988-08-10 EP claimed
EP-0101587-B1 POSITIVE PROCESS FOR OBTAINING RELIEF OR RESIST PATTERNS BASF Aktiengesellschaft (DE) 1987-01-21 EP claimed
EP-0101976-B1 NEGATIVE PROCESS FOR OBTAINING RELIEF OR RESIST PATTERNS BASF Aktiengesellschaft (DE) 1987-01-21 EP claimed
EP-0101586-B1 PROCESS FOR THE MANUFACTURE OF PLATES FOR INTAGLIO PRINTING USING PLASTIC PRINTING FOILS BASF Aktiengesellschaft (DE) 1986-11-12 EP claimed
US-4565771-A Production of gravure printing plates having plastic printing layers BASF AKTIENGESELLSCHAFT (DE) 1986-01-21 US claimed
US-4465760-A Production of relief images or resist images by a negative-working method BASF AKTIENGESELLSCHAFT (DE) 1984-08-14 US claimed
US-4456679-A Production of relief images or resist images by a positive-working method BASF AKTIENGESELLSCHAFT (DE) 1984-06-26 US claimed
EP-0101976-A2 Negative process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-03-07 EP claimed
EP-0101586-A2 Process for the manufacture of plates for intaglio printing using plastic printing foils BASF Aktiengesellschaft (DE) 1984-02-29 EP claimed
EP-0101587-A2 Positive process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-02-29 EP claimed
JP-61197547-A None JP disclosed
WO-2025111422-A1 METAL CHELATORS WAYNE STATE UNIVERSITY (US) 2025-05-30 WO disclosed
US-20250162912-A1 METAL CHELATORS WAYNE STATE UNIVERSITY 2025-05-22 US disclosed
US-9944980-B2 Articles having localized molecules disposed thereon and methods of producing same PACIFIC BIOSCIENCES OF CALIFORNIA, INC. (US) 2018-04-17 US disclosed
EP-0101586-A2 Process for the manufacture of plates for intaglio printing using plastic printing foils BASF Aktiengesellschaft (DE) 1984-02-29 EP disclosed
EP-0101587-A2 Positive process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-02-29 EP disclosed
US-4269933-A PHOTOLITHOGRAPHY; POSITIVE AND NEGATIVE IMAGES; POLYMERIZATION OF A UNSATURATED POLYESTER USING A PHOTOSENSITIVE FREE RADICAL SYSTEM E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-05-26 US disclosed
US-4198242-A Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-04-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250162912-A1 METAL CHELATORS SLC30A7, SLC40A1, SLC39A14 CYP1A2 4562/4885TSHR 3170/4885ALDH1A1 3636/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.