Methoxymethane

Methoxymethane

SCHEMBL5593577

COC.COc1ccccc1C(=O)C(O)c1ccccc1

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.55
ALDH1A1 P00352 2/20 0.55
LMNA P02545 3/20 0.50
CES2 O00748 1/20 0.50
CES1 P23141 1/20 0.50
KCNA3 P22001 1/20 0.49
NPC1 O15118 2/20 0.47
RAB9A P51151 1/20 0.47
CTSD P07339 1/20 0.47
HTT P42858 1/20 0.47
XBP1 P17861 1/20 0.47
MAPK1 P28482 1/20 0.46
TP53 P04637 1/20 0.45
GLA P06280 1/20 0.45
STAT3 P40763 1/20 0.45
MEN1 O00255 1/20 0.44
CRHBP P24387 1/20 0.44
KMT2A Q03164 1/20 0.44
CRHR2 Q13324 1/20 0.44
CA12 O43570 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL277654 0.98 HPGD (0.56) HPGDALDH1A1LMNACES2CES1
Acrylic Acid SCHEMBL11117630 0.90 HPGD (0.49) HPGDALDH1A1LMNACES2CES1
Methoxymethane SCHEMBL28122245 0.88 USP2 (0.51) HPGDALDH1A1LMNACES2CES1
SCHEMBL8800967 0.86 HPGD (0.48) HPGDALDH1A1LMNACES2CES1
SCHEMBL29384 0.86 USP2 (0.52) HPGDALDH1A1LMNACES2CES1
SCHEMBL28029106 0.84 HPGD (0.47) HPGDALDH1A1LMNACES2CES1
SCHEMBL27623521 0.84 KAT6A (0.49) HPGDALDH1A1LMNACES2CES1
Bicarbonate SCHEMBL1969232 0.84 USP2 (0.51) HPGDALDH1A1LMNACES2CES1
Bicarbonate SCHEMBL31648960 0.84 USP2 (0.51) HPGDALDH1A1LMNACES2CES1
Hydrochloric Acid SCHEMBL11475025 0.84 TSHR (0.50) HPGDALDH1A1LMNANPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1779198-A1 PHOTOSENSITIVE COMPOSITION FOR USE IN PRODUCING PRINTING PLATE, AND PHOTOSENSITIVE PRINTING ORIGINAL PLATE LAMINATE AND PRINTING PLATE USING THE PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2007-05-02 EP disclosed
WO-2005124461-A1 PHOTOSENSITIVE COMPOSITION FOR USE IN PRODUCING PRINTING PLATE, AND PHOTOSENSITIVE PRINTING ORIGINAL PLATE LAMINATE AND PRINTING PLATE USING THE PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2005-12-29 WO disclosed
US-4720544-A Process for the preparation of an ester from starch and a monocarboxylic acid, and a composition based on the starch ester thus prepared AKZO N.V. (US) 1988-01-19 US disclosed
EP-0204353-A1 Process for the preparation of an ester from starch and a monocarboxylic acid, and a composition based on the starch ester thus prepared AKZO N.V. (NL) 1986-12-10 EP disclosed