SCHEMBL5595394

SCHEMBL5595394

c1cc2cc(c1)-c1nc3ccc(cc3[nH]1)-c1ccc3nc-2[nH]c3c1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 9/20 0.72
KMT2A Q03164 9/20 0.72
POLB P06746 5/20 0.72
GAA P10253 5/20 0.72
USP2 O75604 2/20 0.72
BLM P54132 2/20 0.72
SMN1; SMN2 Q16637 7/20 0.62
MAPT P10636 7/20 0.62
KDM4E B2RXH2 7/20 0.62
ALDH1A1 P00352 7/20 0.62
HPGD P15428 6/20 0.62
GLA P06280 4/20 0.62
CYP3A4 P08684 4/20 0.62
HSD17B10 Q99714 3/20 0.62
PKM P14618 3/20 0.62
MAPK1 P28482 2/20 0.62
RECQL P46063 2/20 0.62
GMNN O75496 1/20 0.62
THRB P10828 1/20 0.62
NFKB1 P19838 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13299660 0.89 NPC1 (0.72) MEN1KMT2AGAASMN1; SMN2MAPT
SCHEMBL5595593 0.88 MEN1 (0.71) MEN1KMT2APOLBGAAUSP2
SCHEMBL27442744 0.87 NPC1 (0.70) MEN1KMT2AGAASMN1; SMN2MAPT
SCHEMBL34879 0.85 RAB9A (0.74) MEN1KMT2APOLBGAAUSP2
SCHEMBL12175141 0.85 DGAT1 (0.62) MEN1KMT2APOLBGAASMN1; SMN2
SCHEMBL57009 0.85 POLB (0.57) MEN1KMT2APOLBGAAUSP2
SCHEMBL14665558 0.84 NPC1 (0.79) MEN1KMT2APOLBGAAUSP2
SCHEMBL12351220 0.84 MEN1 (1.00) MEN1KMT2APOLBGAAUSP2
SCHEMBL27843946 0.83 CHEK2 (0.63) MEN1KMT2APOLBGAAUSP2
SCHEMBL17867450 0.83 ALDH1A1 (0.71) MEN1KMT2APOLBGAAUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7288603-B2 Polybenzazole compound having sulfonic acid group and/or phosphonic acid group, resin composition containing the same, resin molding, solid polymer electrolyte membrane, solid polymer electrolyte membrane/electrode assembly and method of preparing assembly TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-10-30 US disclosed
EP-1354907-B1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE TOYO BOSEKI (JP) 2006-03-01 EP disclosed
US-20040062969-A1 Polybenzazole compound having sulfo group and/or phosphono group, resin composition containing the same, molded resin, slid polymer electrolyte film, solid electrolyte film/electrode catalyst layer composite, and process for producing the composite TOYO BOSEKI KABUSHIKI KAISHA (JP) 2004-04-01 US disclosed
EP-1354907-A1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE Toyo Boseki Kabushiki Kaisha (JP) 2003-10-22 EP disclosed