SCHEMBL56031

SCHEMBL56031

CCc1ccc2sc3ccccc3c(=O)c2c1CC

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.51
RAB9A P51151 4/20 0.51
NPC1 O15118 3/20 0.51
CYP1A2 P05177 2/20 0.51
CYP3A4 P08684 2/20 0.51
HPGD P15428 2/20 0.51
CYP2C9 P11712 1/20 0.51
CYP2C19 P33261 1/20 0.51
MAOA P21397 2/20 0.48
MAOB P27338 1/20 0.48
ALDH1A1 P00352 6/20 0.44
POLB P06746 4/20 0.44
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
GAA P10253 1/20 0.44
TDP1 Q9NUW8 3/20 0.44
KDM4E B2RXH2 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
CHRM2 P08172 2/20 0.42
HTR1A P08908 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29411158 1.00 MAPT (0.51) MAPTRAB9ANPC1CYP1A2CYP3A4
(Z)-1,2-Diphenylethene SCHEMBL28216307 0.91 MAPT (0.44) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL18535740 0.90 MAPT (0.48) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL27842559 0.90 MAPT (0.48) MAPTRAB9ANPC1CYP1A2CYP3A4
Benzil SCHEMBL28112962 0.89 MAPT (0.43) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL232235 0.89 GPR3 (0.43) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL28259024 0.88 MAPT (0.42) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL28595024 0.86 MAPT (0.50) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL20659803 0.85 MAPT (0.41) MAPTRAB9ANPC1CYP1A2CYP3A4
SCHEMBL29269233 0.85 MAOA (0.56) MAPTRAB9ANPC1CYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 10363 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122080620-A Low-shrinkage photo-curing elastic resin composition based on synergistic compensation and application thereof 2026-05-26 CN claimed
US-20250244664-A1 PHOTORESIST COMPOSITIONS AND PATTERNING METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2025-07-31 US claimed
EP-4004131-B2 UV INKJET COMPOSITIONS SUN CHEMICAL BV (NL) 2025-07-23 EP claimed
US-12351721-B2 Ink jet recording method SEIKO EPSON CORPORATION (JP) 2025-07-08 US claimed
US-12232338-B2 Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof CORNING INCORPORATED (US) 2025-02-18 US claimed
CN-119264336-A Polybutadiene acrylate photosensitive resin composition with self-healing property and application thereof in 405nm photocuring 3D printing 福建农林大学 2025-01-07 CN claimed
CN-111045296-B UV patternable polymer blend for organic thin film transistor 康宁股份有限公司 2024-12-27 CN claimed
CN-118931467-A High-adhesive-strength and high-water-resistance UV (ultraviolet) glue and preparation method thereof 河源然生新材料有限公司 2024-11-12 CN claimed
EP-2445722-B2 PRINTING METHOD SERICOL LTD (GB) 2024-09-04 EP claimed
US-12071551-B2 UV-curable ink composition and a UV-cured printing process SUN CHEMICAL B.V. (NL) 2024-08-27 US claimed
US-5637395-A PHOTOCURABLE RUBBER OR ACRYL-BASED PRESSURE SENSITIVE ADHESIVE; THREE DIMENSIONAL NETWORK NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) 1997-06-10 US claimed
US-5532286-A BONDING STRENGTH EASTMAN KODAK COMPANY (US) 1996-07-02 US claimed
EP-0683174-A2 Thioether containing photopolymerizable compositions EASTMAN KODAK COMPANY (US) 1995-11-22 EP claimed
EP-0283990-B1 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO LTD (JP) 1994-01-26 EP claimed
EP-0157508-B1 THIN ADHESIVE SHEET FOR USE IN WORKING SEMICONDUCTOR WAFERS NITTO DENKO CORPORATION (JP) 1992-07-15 EP claimed
US-4996132-A Heat-resistant photosensitive resin composition TOYKO OHKA KOGYO CO. LTD. (JP) 1991-02-26 US claimed
EP-0306273-A2 Alkaline developable liquid photoimageable solder resist ink composition ARAKAWA CHEMICAL INDUSTRIES, LIMITED (JP) 1989-03-08 EP claimed
EP-0283990-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-09-28 EP claimed
EP-0280295-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-08-31 EP claimed
EP-0157508-A2 Thin adhesive sheet for use in working semiconductor wafers NITTO DENKO CORPORATION (JP) 1985-10-09 EP claimed