Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 6/20 | 0.50 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | NSD2 | O96028 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | KDM2B | Q8NHM5 | 2/20 | 0.34 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.34 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL6815378 | 1.00 | ALDH1A1 (0.50) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Acetic Acid SCHEMBL27930643 | 0.90 | ALDH1A1 (0.56) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Methacrylic Acid SCHEMBL29733321 | 0.85 | ALDH1A1 (0.46) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Methacrylic Acid SCHEMBL4254749 | 0.84 | POLB (0.38) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Methacrylic Acid SCHEMBL11585483 | 0.84 | ALDH1A1 (0.63) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Anthracene SCHEMBL1711588 | 0.84 | KDM4E (0.45) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Benzene SCHEMBL28779493 | 0.84 | CYP1A2 (0.67) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Anthracene SCHEMBL29778690 | 0.84 | KDM4E (0.45) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Acrylic Acid SCHEMBL3862092 | 0.83 | ALDH1A1 (0.50) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E | |
| Methacrylic Acid SCHEMBL28257075 | 0.83 | ALDH1A1 (0.45) | ALDH1A1CYP1A2HPGDHSD17B10KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-20120034562-A1 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST | WAYTON GERALD B (US) | 2012-02-09 | — | — | US | disclosed |
| CN-1550889-B | Multilayer photoresist system | SHIPLEY CO LLC | 2011-08-03 | — | — | CN | disclosed |
| CN-1828420-B | Coating compositions for use with an overcoated photoresist | ROHM & HAAS ELECT MAT | 2010-07-21 | — | — | CN | disclosed |
| US-7632630-B2 | Dyed photoresists and methods and articles of manufacture comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-12-15 | — | — | US | disclosed |
| US-20090220888-A1 | Dyed photoresists and methods and articles of manufacture comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2009-09-03 | — | — | US | disclosed |
| US-7582412-B2 | Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-7582360-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-7306892-B2 | Multilayer photoresist system | SHIPLEY COMPANY, L.L.C. (US) | 2007-12-11 | — | — | US | disclosed |
| US-20070092746-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-26 | — | — | US | disclosed |
| EP-1178354-A1 | Antireflective coating compositions | Shipley Company LLC (US) | 2002-02-06 | — | — | EP | disclosed |
| US-20020012875-A1 | Antireflective coating compositions comprising photoacid generators | SHIPLEY COMPANY, L.L.C. (US) | 2002-01-31 | — | — | US | disclosed |
| US-20010012598-A1 | High conformality antireflective coating compositions | SHIPLEY COMPANY, L.L.C. (US) | 2001-08-09 | — | — | US | disclosed |
| US-6261743-B1 | APPLYING ON A SUBSTRATE A LAYER OF AN ANTIREFLECTIVE COMPOSITION COMPRISED OF PHOTOACID GENERATOR COMPOUND, ACID OR THERMAL ACID GENERATOR COMPOUND, & CROSSLINKER, THEN DEVELOPING THE EXPOSED PHOTORESIST | SHIPLEY COMPANY, L.L.C. | 2001-07-17 | — | — | US | disclosed |
| US-6190839-B1 | EXHIBIT EXCEPTIONAL CONFORMALITY UPON APPLICATION TO A SUBSTRATE SURFACE. FOR EXAMPLE, ARCS OF THE INVENTION CAN COAT SUBSTANTIAL TOPOGRAPHY SUCH AS VERTICAL AND SLOPING STEPS WITH HIGH CONFORMALITY. | SHIPLEY COMPANY, L.L.C. | 2001-02-20 | — | — | US | disclosed |
| US-6033830-A | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-07 | — | — | US | disclosed |
| US-5939236-A | Antireflective coating compositions comprising photoacid generators | SHIPLEY COMPANY, L.L.C. (US) | 1999-08-17 | — | — | US | disclosed |
| US-5886102-A | Antireflective coating compositions | SHIPLEY COMPANY, L.L.C. (US) | 1999-03-23 | — | — | US | disclosed |
| EP-0834770-A2 | Dyed photoresists and methods and articles of manufacture comprising same | Shipley Company LLC (US) | 1998-04-08 | — | — | EP | disclosed |
| EP-0813114-A2 | Antireflective coating compositions | Shipley Company LLC (US) | 1997-12-17 | — | — | EP | disclosed |