SCHEMBL5604434

SCHEMBL5604434

CCCCCOOC(C)(C)CC(C)(C)C

nearest known ligand 0.30

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.30
CA2 P00918 2/20 0.30
CA9 Q16790 2/20 0.30
MEN1 O00255 1/20 0.30
THRB P10828 1/20 0.30
HTT P42858 1/20 0.30
KMT2A Q03164 1/20 0.30
CA12 O43570 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4455747 0.98 THRB (0.33) CA1CA2CA9MEN1THRB
SCHEMBL5943669 0.93 ADRB2 (0.33)
SCHEMBL30251809 0.82 TSHR (0.36) CA1CA2CA9MEN1THRB
SCHEMBL28498307 0.80 LPAR3 (0.39) CA1CA2CA9MEN1THRB
SCHEMBL6904052 0.80 LPAR3 (0.39) CA1CA2CA9MEN1THRB
SCHEMBL9149359 0.78 THRB (0.35) CA1CA2CA9MEN1THRB
Hexane SCHEMBL28248364 0.78 THRB (0.35) CA1CA2CA9MEN1THRB
SCHEMBL9625883 0.77 THRB (0.35) CA1CA2CA9MEN1THRB
SCHEMBL2049836 0.77 TSHR (0.35) CA1CA2CA9MEN1THRB
SCHEMBL4268446 0.76 DGKA (0.59) MEN1THRBKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1239332-B1 PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF AZ ELECTRONIC MATERIALS USA (US) 2007-02-21 EP disclosed
US-6902875-B2 Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-07 US disclosed
US-20030113657-A1 Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof MERCK PATENT GMBH (DE) 2003-06-19 US disclosed
EP-1239332-A1 PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF CLARIANT INTERNATIONAL LTD. (CH) 2002-09-11 EP disclosed