SCHEMBL5604794

SCHEMBL5604794

CCC=C(C)C(=O)OCCN(C)C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 2/20 0.47
CHRM2 P08172 1/20 0.47
CHRM4 P08173 1/20 0.47
CHRM5 P08912 1/20 0.47
CHRNB2 P17787 1/20 0.47
CHRM3 P20309 1/20 0.47
CHRNA4 P43681 1/20 0.47
DNM1 Q05193 1/20 0.42
BCHE P06276 2/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA9 Q16790 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
PHLPP2 Q6ZVD8 1/20 0.37
ALDH1A1 P00352 3/20 0.36
MAPT P10636 2/20 0.36
NPSR1 Q6W5P4 1/20 0.34
CYP1A2 P05177 2/20 0.33
LMNA P02545 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL29268857 0.98 CHRM2 (0.46) CHRM1CHRM2CHRM4CHRM5CHRNB2
Sulfuric Acid SCHEMBL28116564 0.93 CHRM1 (0.42) CHRM1CHRM2CHRM4CHRM5CHRNB2
Sulfuric Acid SCHEMBL16660529 0.93 CHRM1 (0.42) CHRM1CHRM2CHRM4CHRM5CHRNB2
SCHEMBL28027536 0.86 CHRM2 (0.44) CHRM1CHRM2CHRM4CHRM5CHRNB2
SCHEMBL27985333 0.85 CHRM1 (0.47) CHRM1CHRM2CHRM4CHRM5CHRNB2
SCHEMBL12984317 0.84 THRB (0.42) CHRM1CHRM5CHRM3ALDH1A1NPSR1
SCHEMBL127393 0.84 CHRM1 (0.46) CHRM1CHRM2CHRM4CHRM5CHRNB2
SCHEMBL714694 0.84 CHRM1 (0.46) CHRM1CHRM2CHRM4CHRM5CHRNB2
SCHEMBL28947296 0.84 LMNA (0.41) CHRM1CHRM2CHRM4CHRM5CHRM3
SCHEMBL12610060 0.83 DNM1 (0.49) CHRM1CHRM2CHRM4CHRM5CHRNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6599958-B2 A) polymeric compound, especially an acrylate; b) a photoinitiator, especially a phosphinate or phosphine oxide; and c) a photoaccelerator, especially aliphatic amines and aromatic amines. GEL PRODUCTS, INC. 2003-07-29 US claimed
US-6391938-B1 CONTAINING METHACRYOYLOXYETHYL PHTHALATE GEL PRODUCTS, INC. 2002-05-21 US claimed
US-20020010226-A1 Radiation curable nail coatings REVLON CONSUMER PRODUCTS CORPORATION 2002-01-24 US claimed
CN-115516167-A Process for producing a nanocoated substrate 斯道拉恩索公司 2022-12-23 CN disclosed
US-20070208105-A1 COMPOSTABLE VINYL HALIDE POLYMER COMPOSITIONS, COMPOSITES AND LANDFILL BIODEGRADATION BIOTECH PRODUCTS, LLC 2007-09-06 US disclosed
US-20050065297-A1 Radiation curable nail polish AMERICAN INTERNATIONAL INDUSTRIES 2005-03-24 US disclosed
US-6599958-B2 A) polymeric compound, especially an acrylate; b) a photoinitiator, especially a phosphinate or phosphine oxide; and c) a photoaccelerator, especially aliphatic amines and aromatic amines. GEL PRODUCTS, INC. 2003-07-29 US disclosed
US-6481444-B1 Finishing compounds for radiation curable nail coatings GEL PRODUCTS, INC. 2002-11-19 US disclosed
US-6391938-B1 CONTAINING METHACRYOYLOXYETHYL PHTHALATE GEL PRODUCTS, INC. 2002-05-21 US disclosed
US-20020010226-A1 Radiation curable nail coatings REVLON CONSUMER PRODUCTS CORPORATION 2002-01-24 US disclosed
EP-0024164-B1 PREPARATION OF NON-CROSS-LINKED POLYMERS, MOULDING PROCESS THEREFOR AND CONTACT LENSES PRODUCED BY THE PROCESS Coopervision U.K. Limited (GB) 1983-06-22 EP disclosed