Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.40 |
| ▸ | HPGD | P15428 | 5/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ELANE | P08246 | 1/20 | 0.36 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | CDC25B | P30305 | 1/20 | 0.32 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5594212 | 0.86 | ALDH1A1 (0.39) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL4647200 | 0.83 | ALDH1A1 (0.44) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL12383185 | 0.80 | ALDH1A1 (0.39) | ALDH1A1HPGDCYP1A2CYP2C19MAPT | |
| SCHEMBL18906414 | 0.77 | EDNRA (0.40) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL417333 | 0.76 | ELANE (0.45) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL7698292 | 0.75 | RAD52 (0.37) | ALDH1A1KDM4EHPGDGLAMAPT | |
| SCHEMBL13801028 | 0.75 | TDP1 (0.36) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| Anthracene SCHEMBL22577736 | 0.74 | ELANE (0.47) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL13801030 | 0.74 | TDP1 (0.40) | ALDH1A1KDM4EHPGDMEN1KMT2A | |
| SCHEMBL12383183 | 0.73 | ALDH1A1 (0.41) | ALDH1A1KDM4EHPGDMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-20120034562-A1 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST | WAYTON GERALD B (US) | 2012-02-09 | — | — | US | disclosed |
| US-7582360-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-20070092746-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-26 | — | — | US | disclosed |
| US-7163751-B2 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. (US) | 2007-01-16 | — | — | US | disclosed |
| US-6852421-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-08 | — | — | US | disclosed |
| US-20040209200-A1 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | disclosed |
| US-20040067437-A1 | Coating compositions for use with an overcoated photoresist | SHIPLEY COMPANY, L.L.C. | 2004-04-08 | — | — | US | disclosed |
| US-20030180559-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. | 2003-09-25 | — | — | US | disclosed |
| EP-1298492-A2 | Coating compositions for use with an overcoated photoresist | Shipley Co. L.L.C. (US) | 2003-04-02 | — | — | EP | disclosed |
| EP-1298493-A2 | Coating compositions for use with an overcoated photoresist | Shipley Company LLC (US) | 2003-04-02 | — | — | EP | disclosed |