SCHEMBL5619862

SCHEMBL5619862

N#CCCN(CCO)CCCC(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.44
CAMK2A Q9UQM7 1/20 0.40
GPR84 Q9NQS5 1/20 0.38
FFAR1 O14842 1/20 0.38
FFAR4 Q5NUL3 1/20 0.38
LMNA P02545 3/20 0.34
SLC22A6 Q4U2R8 1/20 0.34
CYP1A2 P05177 2/20 0.33
TSHR P16473 2/20 0.33
CYP2D6 P10635 1/20 0.33
MAPT P10636 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
HSD17B10 Q99714 1/20 0.33
NFKB1 P19838 1/20 0.33
PMP22 Q01453 1/20 0.33
KDM5A P29375 3/20 0.33
PHF8 Q9UPP1 2/20 0.31
KDM4C Q9H3R0 1/20 0.31
PTPN7 P35236 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5701701 0.89 LCK (0.38) LCKCAMK2AGPR84FFAR1FFAR4
SCHEMBL12119522 0.85 LCK (0.47) LCKGPR84FFAR1FFAR4LMNA
SCHEMBL8585287 0.84 CAMK2A (0.55) CAMK2AGPR84FFAR1FFAR4LMNA
SCHEMBL5619838 0.84 CAMK2A (0.41) CAMK2AGPR84FFAR1FFAR4LMNA
SCHEMBL4796638 0.81 LCK (0.43) LCKLMNATSHRCYP2C19HSD17B10
SCHEMBL3429422 0.81 LCK (0.54) LCK
SCHEMBL64977 0.80 LCK (0.50) LCKTSHRMAPT
SCHEMBL65324 0.80 LCK (0.50) LCKTSHRMAPT
SCHEMBL5619133 0.80 ALDH1A1 (0.44) LCKLMNASLC22A6CYP1A2TSHR
SCHEMBL3429419 0.79 LCK (0.48) LCK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7169541-B2 Compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-20050014092-A1 Novel compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-20 US disclosed