SCHEMBL5701701

SCHEMBL5701701

N#CCCN(CCO)CCC(=O)O

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.38
USP2 O75604 1/20 0.34
HSD17B10 Q99714 1/20 0.34
CAMK2A Q9UQM7 1/20 0.33
ALDH1A1 P00352 3/20 0.33
POLB P06746 1/20 0.33
HPGD P15428 1/20 0.33
GPR84 Q9NQS5 1/20 0.31
FFAR1 O14842 1/20 0.31
FFAR4 Q5NUL3 1/20 0.31
NPC1 O15118 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
KDM5A P29375 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31
ALOX15 P16050 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4796638 0.92 LCK (0.43) LCKUSP2HSD17B10ALDH1A1POLB
SCHEMBL5619862 0.89 LCK (0.44) LCKHSD17B10CAMK2AGPR84FFAR1
Trolamine SCHEMBL11791924 0.83 CAMK2A (0.46) CAMK2AGPR84FFAR1FFAR4KDM5A
SCHEMBL563771 0.83 CAMK2A (0.46) CAMK2AGPR84FFAR1FFAR4KDM5A
SCHEMBL5067889 0.83 CAMK2A (0.46) CAMK2AGPR84FFAR1FFAR4KDM5A
SCHEMBL65324 0.83 LCK (0.50) LCKALDH1A1NPC1L3MBTL1KDM4E
SCHEMBL64977 0.83 LCK (0.50) LCKALDH1A1NPC1L3MBTL1KDM4E
SCHEMBL65436 0.82 KMT2A (0.43) LCKHSD17B10ALDH1A1HPGDKDM5A
SCHEMBL21513124 0.81 TDP1 (0.43) CAMK2AALDH1A1GPR84FFAR1FFAR4
SCHEMBL11380835 0.81 LCK (0.48) LCKALDH1A1KDM4EMAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1698937-B1 Positive resist composition and pattern-forming method using the same FUJIFILM CORP (JP) 2015-12-23 EP disclosed
EP-1698937-A2 Positive resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-09-06 EP disclosed