⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12384266 | 0.71 | HSD11B1 (0.45) | — | |
| Ammonia Solution, Strong SCHEMBL28327678 | 0.69 | HSD11B1 (0.44) | — | |
| SCHEMBL6965444 | 0.66 | — | — | |
| SCHEMBL9342142 | 0.64 | — | — | |
| SCHEMBL28515210 | 0.64 | POLB (0.48) | — | |
| SCHEMBL15853319 | 0.64 | ALDH1A1 (0.33) | — | |
| SCHEMBL4812492 | 0.60 | — | — | |
| SCHEMBL11486883 | 0.59 | TSHR (0.42) | — | |
| SCHEMBL7470016 | 0.57 | — | — | |
| SCHEMBL8189306 | 0.57 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | claimed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | claimed |
| US-8580484-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-12 | — | — | US | disclosed |
| US-20120034735-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | LEE SANG KYUN (KR) | 2012-02-09 | — | — | US | disclosed |
| US-8053158-B2 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-11-08 | — | — | US | disclosed |
| US-20070202436-A1 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-30 | — | — | US | disclosed |
| US-7256419-B2 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-14 | — | — | US | disclosed |
| EP-1542241-B1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-09-27 | — | — | EP | disclosed |
| EP-1542241-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | Samsung Electronics Co., Ltd (KR) | 2005-06-15 | — | — | EP | disclosed |