Thiosulfuric Acid

Thiosulfuric Acid

SCHEMBL564322

CCCO.O=S(O)(O)=S

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Thiosulfuric Acid SCHEMBL30990190 0.86
Thiosulfuric Acid SCHEMBL20269406 0.86
Sulfuric Acid SCHEMBL921213 0.86
Thiosulfuric Acid SCHEMBL29164195 0.83 ALDH1A1 (0.43)
Sulfuric Acid SCHEMBL8613107 0.83 CA5A (0.43)
Propanol SCHEMBL7211728 0.83
Propanol SCHEMBL28376464 0.83 CA2 (0.39)
Sulfuric Acid SCHEMBL8613115 0.83 CA5A (0.43)
Sulfuric Acid SCHEMBL28534862 0.83 CA5A (0.43)
Sulfuric Acid SCHEMBL28535717 0.83 CA5A (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8956523-B2 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-20140081045-A1 METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 US disclosed
EP-1978134-B1 Metal plating compositions ROHM & HAAS ELECT MAT (US) 2013-09-11 EP disclosed
US-8337688-B2 Metal plating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-25 US disclosed
US-8329018-B2 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-11 US disclosed
EP-1978051-B1 Metal plating compositions and methods ROHM & HAAS ELECT MAT (US) 2012-02-22 EP disclosed
US-20120034371-A1 METAL PLATING COMPOSITIONS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-02-09 US disclosed
US-20110318479-A1 METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-12-29 US disclosed
US-8048284-B2 Mixture of metal compound and polyamideether copolymer; electrical or decorative article; printed circuits; improved leveling and throwing power ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-01 US disclosed
US-8012334-B2 provide good leveling performance and throwing power; additives to improve the brightness, ductility and plating distribution of the metal deposit ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-09-06 US disclosed
US-20080269395-A1 Metal plating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
US-20080268138-A1 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
EP-1978051-A1 Metal plating compositions and methods Rohm and Haas Electronic Materials, L.L.C. (US) 2008-10-08 EP disclosed
EP-1978134-A1 Metal plating compositions Rohm and Haas Electronic Materials LLC (US) 2008-10-08 EP disclosed
US-20040104124-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2004-06-03 US disclosed
US-6736954-B2 A METAL PLATING BATH COMPRISING METAL SALTS AND AN ADDITIVE CONSUMPTION INHIBITOR(A HETEROATOM ORGANIC COMPOUNDS WHICH MAY CONTAIN SULFUR, OXYGEN OR NITROGEN HETEROATOMS) IMPROVE THE BRIGHTNESS OF PLATED METAL AS WELL AS THE DUCTILITY SHIPLEY COMPANY, L.L.C. 2004-05-18 US disclosed
EP-1308540-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-05-07 EP disclosed
US-20030070934-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-17 US disclosed