SCHEMBL5643237

SCHEMBL5643237

C=C1CCC(C2OCCO2)CC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3613541 0.75 ALDH1A1 (0.35) ESR2
SCHEMBL19015223 0.74 — —
SCHEMBL5119893 0.71 ALDH1A1 (0.32) —
SCHEMBL18018647 0.70 ALDH1A1 (0.42) —
SCHEMBL1560004 0.69 ALDH1A1 (0.44) —
SCHEMBL15572079 0.69 — —
SCHEMBL15849491 0.68 — —
SCHEMBL179699 0.68 — —
SCHEMBL123556 0.68 — —
SCHEMBL5704247 0.67 ALDH1A1 (0.41) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7282316-B2 Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-16 — — US disclosed
US-20050048395-A1 Novel sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. 2005-03-03 — — US disclosed
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