Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 8/20 | 0.67 |
| ▸ | MAPT | P10636 | 5/20 | 0.67 |
| ▸ | MEN1 | O00255 | 3/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.67 |
| ▸ | POLB | P06746 | 1/20 | 0.67 |
| ▸ | RAB9A | P51151 | 1/20 | 0.67 |
| ▸ | CA1 | P00915 | 2/20 | 0.61 |
| ▸ | CA2 | P00918 | 2/20 | 0.61 |
| ▸ | CA4 | P22748 | 1/20 | 0.61 |
| ▸ | CA6 | P23280 | 1/20 | 0.61 |
| ▸ | ESR1 | P03372 | 1/20 | 0.54 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.53 |
| ▸ | GFER | P55789 | 1/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.50 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | IDH1 | O75874 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29412587 | 1.00 | GAA (0.67) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL29860720 | 1.00 | GAA (0.67) | GAAMAPTMEN1KMT2AKDM4E | |
| Hydrochloric Acid SCHEMBL21173959 | 0.98 | GAA (0.64) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL8514724 | 0.91 | GAA (0.83) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL564633 | 0.91 | ESR1 (0.58) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL565060 | 0.91 | ALDH1A1 (0.58) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL29350695 | 0.89 | IDH1 (0.68) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL564652 | 0.89 | IDH1 (0.68) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL20132138 | 0.88 | ALDH1A1 (0.61) | GAAMAPTMEN1KMT2AKDM4E | |
| SCHEMBL564946 | 0.88 | KDM4E (0.53) | GAAMAPTMEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 621 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4506753-A2 | PHOTOSENSITIVE COMPOSITION | Duksan Neolux Co., Ltd (KR) | 2025-02-12 | — | — | EP | claimed |
| US-20250044690-A1 | PHOTOSENSITIVE COMPOSITION | Duksan Neolux Co., Ltd. (KR) | 2025-02-06 | — | — | US | claimed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-118725295-A | Resin, preparation method and application of resin | 华为技术有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-118108661-B | Diamine monomer with nitrogen heterocycle and benzocyclobutene structure, and preparation method and application thereof | 波米科技有限公司 | 2024-09-20 | — | — | CN | claimed |
| CN-115232017-B | Compound, resin and preparation method and application thereof | 华为技术有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-118108661-A | Diamine monomer with nitrogen heterocycle and benzocyclobutene structure, and preparation method and application thereof | 波米科技有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-114524938-B | Polymer, photosensitive resin composition, cured film prepared from polymer and photosensitive resin composition, and electronic element | 江苏三月科技股份有限公司 | 2024-02-09 | — | — | CN | claimed |
| CN-116836389-B | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-112175182-A | Positive photosensitive polyesteramide resin and composition using same | 明士(北京)新材料开发有限公司 | 2021-01-05 | — | — | CN | claimed |
| CN-111522201-A | Positive photosensitive resin composition, cured film prepared from positive photosensitive resin composition and electronic element | 江苏三月科技股份有限公司 | 2020-08-11 | — | — | CN | claimed |
| EP-3512905-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2019-07-24 | — | — | EP | claimed |
| CN-109181622-A | A kind of highly heat-resistant polyimide insulating materials of low-temperature setting | 浙江福斯特新材料研究院有限公司 | 2019-01-11 | — | — | CN | claimed |
| US-9975996-B2 | Positive photosensitive resin composition and polyhydroxyamide resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | claimed |
| WO-2018050489-A1 | METHOD FOR PRODUCING A POLYBENZAZOL POLYMER (P) | BASF SE (DE) | 2018-03-22 | — | — | WO | claimed |
| US-20160185905-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | claimed |
| US-20120305484-A1 | Thermally Rearranged (TR) Polymers as Membranes for Ethanol Dehydration | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2012-12-06 | — | — | US | claimed |
| WO-2012166153-A1 | THERMALLY REARRANGED (TR) POLYMERS AS MEMBRANES FOR ETHANOL DEHYDRATION | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMS (US) | 2012-12-06 | — | — | WO | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |