SCHEMBL565205

SCHEMBL565205

CCC(C(=O)O)S(=O)(O)=S

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.34
MMP9 P14780 1/20 0.34
GCLC P48506 1/20 0.32
CA2 P00918 1/20 0.32
MAPK1 P28482 1/20 0.32
CHRM1 P11229 1/20 0.32
AKR1A1 P14550 1/20 0.32
CHRM3 P20309 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
ADRA1A P35348 1/20 0.32
HRH1 P35367 1/20 0.32
DRD3 P35462 1/20 0.32
SLC6A3 Q01959 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
SLC1A3 P43003 1/20 0.31
SLC1A2 P43004 1/20 0.31
SLC1A1 P43005 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL890709 0.80 CHRM1 (0.40) MMP2MMP9GCLCCA2MAPK1
SCHEMBL11855922 0.79 CA1 (0.34) CA2
SCHEMBL5022363 0.78 CHRM1 (0.39) MMP2MMP9GCLCCA2MAPK1
SCHEMBL5013300 0.78 CHRM1 (0.39) MMP2MMP9GCLCCA2MAPK1
SCHEMBL5014288 0.78 CHRM1 (0.39) MMP2MMP9GCLCCA2MAPK1
SCHEMBL5014260 0.78 CHRM1 (0.39) MMP2MMP9GCLCCA2MAPK1
SCHEMBL7241006 0.75 CHRM1 (0.35) MMP2MMP9GCLCCA2MAPK1
SCHEMBL29029474 0.75 PMP22 (0.35) MMP2MMP9GCLCCA2MAPK1
SCHEMBL5761 0.75 PMP22 (0.35) MMP2MMP9GCLCCA2MAPK1
SCHEMBL1634572 0.73 MMP2 (0.35) MMP2MMP9GCLCCA2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8956523-B2 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-20140081045-A1 METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 US disclosed
EP-1978134-B1 Metal plating compositions ROHM & HAAS ELECT MAT (US) 2013-09-11 EP disclosed
US-8337688-B2 Metal plating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-25 US disclosed
US-8329018-B2 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-12-11 US disclosed
EP-1978051-B1 Metal plating compositions and methods ROHM & HAAS ELECT MAT (US) 2012-02-22 EP disclosed
US-20120034371-A1 METAL PLATING COMPOSITIONS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-02-09 US disclosed
US-20110318479-A1 METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-12-29 US disclosed
US-8048284-B2 Mixture of metal compound and polyamideether copolymer; electrical or decorative article; printed circuits; improved leveling and throwing power ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-01 US disclosed
US-8012334-B2 provide good leveling performance and throwing power; additives to improve the brightness, ductility and plating distribution of the metal deposit ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-09-06 US disclosed
US-20080269395-A1 Metal plating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
US-20080268138-A1 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
EP-1978051-A1 Metal plating compositions and methods Rohm and Haas Electronic Materials, L.L.C. (US) 2008-10-08 EP disclosed
EP-1978134-A1 Metal plating compositions Rohm and Haas Electronic Materials LLC (US) 2008-10-08 EP disclosed
US-20040104124-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2004-06-03 US disclosed
US-6736954-B2 A METAL PLATING BATH COMPRISING METAL SALTS AND AN ADDITIVE CONSUMPTION INHIBITOR(A HETEROATOM ORGANIC COMPOUNDS WHICH MAY CONTAIN SULFUR, OXYGEN OR NITROGEN HETEROATOMS) IMPROVE THE BRIGHTNESS OF PLATED METAL AS WELL AS THE DUCTILITY SHIPLEY COMPANY, L.L.C. 2004-05-18 US disclosed
EP-1308540-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-05-07 EP disclosed
US-20030070934-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-17 US disclosed