⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7878931 | 0.85 | — | — | |
| SCHEMBL4404945 | 0.82 | CYP2D6 (0.32) | — | |
| SCHEMBL21117634 | 0.76 | — | — | |
| SCHEMBL9802803 | 0.71 | OPRK1 (0.34) | — | |
| SCHEMBL8613888 | 0.68 | SLC6A4 (0.31) | — | |
| SCHEMBL7638347 | 0.68 | HPSE (0.33) | — | |
| SCHEMBL5395254 | 0.68 | KMT2A (0.30) | — | |
| SCHEMBL6137153 | 0.67 | KMT2A (0.31) | — | |
| SCHEMBL1698007 | 0.67 | CYP2D6 (0.33) | — | |
| SCHEMBL6727387 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2018-01-11 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9291893-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9268226-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-23 | — | — | US | disclosed |
| EP-1207423-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-22 | — | — | EP | disclosed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| US-20010046641-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-29 | — | — | US | disclosed |
| US-20010044070-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | disclosed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |
| US-6165672-A | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-12-26 | — | — | US | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |