⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL40787 | 1.00 | — | — | |
| SCHEMBL2904792 | 1.00 | ALDH1A1 (0.32) | — | |
| SCHEMBL498502 | 0.96 | — | — | |
| SCHEMBL1972246 | 0.89 | — | — | |
| SCHEMBL1765599 | 0.69 | ALDH1A1 (0.35) | — | |
| SCHEMBL260002 | 0.67 | — | — | |
| SCHEMBL380295 | 0.67 | — | — | |
| SCHEMBL4351236 | 0.67 | — | — | |
| SCHEMBL459108 | 0.67 | — | — | |
| SCHEMBL8989855 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070269736-A1 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-22 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-20040121399-A1 | Substrate bound linker molecules for the construction of biomolecule microarrays | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-24 | — | — | US | claimed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| CN-113967258-B | FAP-activated therapeutic agents and related uses | 塔夫茨大学信托人 | 2024-07-02 | — | — | CN | disclosed |
| CN-111864271-B | Electrolyte additive for lithium secondary battery, electrolyte for lithium secondary battery, and lithium secondary battery including electrolyte | 三星SDI株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-111403809-B | Additive for lithium secondary battery, electrolyte and lithium secondary battery comprising same | 三星SDI株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-11728513-B2 | Elecrolyte additive for lithium secondary battery, electrolyte for lithium secondary battery, and lithium secondary battery including electrolyte | SAMSUNG SDI CO., LTD. (KR) | 2023-08-15 | — | — | US | disclosed |
| US-4874898-A | ANTIANDROGENS | SHIONOGI AND CO., LTD. PATENT DEPARTMENT (JP) | 1989-10-17 | — | — | US | disclosed |
| EP-0330059-A2 | Mixture polymerisable by radiation, and a recording material manufactured from it | MORTON INTERNATIONAL, INC. (US) | 1989-08-30 | — | — | EP | disclosed |
| US-4631272-A | N-acylated 1-alkylamino-1-deoxy-ketose derivatives, a process for their preparation and their use | BAYER AKTIENGESELLSCHAFT (DE) | 1986-12-23 | — | — | US | disclosed |
| EP-0152856-A2 | N-acylated 1-alkylamimo-1-desoxy ketose derivatives, method for their preparation and use | BAYER AG (DE) | 1985-08-28 | — | — | EP | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |