Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.32 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL40787 | 1.00 | — | — | |
| SCHEMBL566960 | 1.00 | — | — | |
| SCHEMBL498502 | 0.96 | — | — | |
| SCHEMBL1972246 | 0.89 | — | — | |
| SCHEMBL1765599 | 0.69 | ALDH1A1 (0.35) | ALDH1A1TRIM24TRIM33 | |
| SCHEMBL260002 | 0.67 | — | — | |
| SCHEMBL380295 | 0.67 | — | — | |
| SCHEMBL4351236 | 0.67 | — | — | |
| SCHEMBL459108 | 0.67 | — | — | |
| SCHEMBL8989855 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070269736-A1 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-22 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| US-9519215-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS, LTD (GB) | 2016-12-13 | — | — | US | disclosed |
| US-20160246173-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-08-25 | — | — | US | disclosed |
| US-9229322-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-01-05 | — | — | US | disclosed |
| US-9122156-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2015-09-01 | — | — | US | disclosed |
| US-20150140489-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2015-05-21 | — | — | US | disclosed |
| US-20150140491-A1 | Composition of Matter and Molecular Resist Made Therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2015-05-21 | — | — | US | disclosed |
| US-6586156-B2 | A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-07-01 | — | — | US | disclosed |
| US-20030049561-A1 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-03-13 | — | — | US | disclosed |
| US-6420084-B1 | RADIATION-SENSITIVE RESIST COMPRISING A POLYSILSESQUIOXANE; PATTERNED METAL LAYER SELECTED FROM CR, CU, AL, AND ALLOYS, LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-07-16 | — | — | US | disclosed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | disclosed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | disclosed |
| US-4228069-A | FOAMING AGENTS FOR UNSATURATED POLYESTERS | PENNWALT CORPORATION (US) | 1980-10-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150140489-A1 | Composition of Matter and Molecular Resist Made Therefrom | HNRNPM, TUFM, MSR1 | ALDH1A1 3776/4885TRIM24 3149/4885TRIM33 3056/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.