Sulfuric Acid

Sulfuric Acid

SCHEMBL5678657

N#[N+]c1ccc(Oc2ccccc2)cc1.N#[N+]c1ccc(Oc2ccccc2)cc1.O=S(=O)([O-])[O-]

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SOS1 Q07889 1/20 0.52
▸ LMNA P02545 3/20 0.47
▸ HTT P42858 2/20 0.47
▸ SMN1; SMN2 Q16637 2/20 0.47
▸ CA1 P00915 1/20 0.47
▸ CA2 P00918 1/20 0.47
▸ CA9 Q16790 1/20 0.47
▸ LTA4H P09960 3/20 0.44
▸ TSHR P16473 1/20 0.44
▸ PGR P06401 4/20 0.43
▸ MMP1 P03956 2/20 0.42
▸ MMP3 P08254 2/20 0.42
▸ MMP8 P22894 2/20 0.42
▸ MMP13 P45452 1/20 0.42
▸ PABPC1 P11940 1/20 0.41
▸ EIF4H Q15056 1/20 0.41
▸ CTDSP1 Q9GZU7 1/20 0.41
▸ NR1H2 P55055 1/20 0.41
▸ BAX Q07812 1/20 0.41
▸ MAOA P21397 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL5678667 0.93 SOS1 (0.49) SOS1LMNAHTTSMN1; SMN2CA1
Sulfuric Acid SCHEMBL5678661 0.89 CA1 (0.47) SOS1LMNAHTTSMN1; SMN2CA1
SCHEMBL6291052 0.88 LTA4H (0.57) SOS1CA1CA2CA9LTA4H
Hydrochloric Acid SCHEMBL3796451 0.86 LTA4H (0.55) SOS1CA1CA2CA9LTA4H
Sulfuric Acid SCHEMBL3796273 0.84 HTT (0.50) LMNAHTTSMN1; SMN2CA1CA2
Sulfuric Acid SCHEMBL4738161 0.82 CA4 (0.37) SOS1SMN1; SMN2CA1CA2CA9
SCHEMBL28476939 0.81 LTA4H (0.48) SOS1CA1CA2CA9LTA4H
Sulfuric Acid SCHEMBL9180289 0.80 CA4 (0.36) SMN1; SMN2CA1CA2CA9TSHR
Diphenylether SCHEMBL4275227 0.80 LTA4H (0.63) SOS1LMNAHTTSMN1; SMN2CA1
Diphenylether SCHEMBL9763790 0.80 LTA4H (0.63) SOS1LMNAHTTSMN1; SMN2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 — — EP claimed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 — — WO claimed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 — — US claimed
EP-1421447-A4 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID KODAK POLYCHROME GRAPHICS LLC (US) 2006-09-06 — — EP disclosed
US-7056639-B2 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid EASTMAN KODAK COMPANY (US) 2006-06-06 — — US disclosed
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 — — EP disclosed
US-6921620-B2 Acid curable composition of an acid generator; an infrared absorber; and optional colorant KODAK POLYCHROME GRAPHICS LLC (US) 2005-07-26 — — US disclosed
US-20050079439-A1 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid KODAK POLYCHROME GRAPHICS LLC (US) 2005-04-14 — — US disclosed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 — — WO disclosed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 — — US disclosed
US-6821583-B2 SUBSTRATE WITH A CROSSLINKED LAYER DISPOSED ON IT HAVING AN IMAGEABLE INK-RECEPTIVE LAYER THAT IS ABLATION FREE KODAK POLYCHROME GRAPHICS LLC 2004-11-23 — — US disclosed
US-6783911-B2 POSITIVE WORKING; HYDROXYFUNCTIONAL RESIN COMPRISING A COVALENTLY BOUND RADIATION SENSITIVE GROUP CAPABLE OF INCREASING THE SOLUBILITY OF SAID IMAGEABLE COMPOSITION IN AN ALKALINE DEVELOPER UPON EXPOSURE TO RADIATION KODAK POLYCHROME GRAPHICS LLC 2004-08-31 — — US disclosed
EP-1421447-A1 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID Kodak Polychrome Graphics LLC (US) 2004-05-26 — — EP disclosed
US-20040009363-A1 Substrate with a crosslinked layer disposed on it having an imageable ink-receptive layer that is ablation free KODAK POLYCHROME GRAPHICS, L.L.C. (US) 2004-01-15 — — US disclosed
US-20030194635-A1 Isocyanate crosslinked imageable compositions KODAK POLYCHROME GRAPHICS, L.L.C. 2003-10-16 — — US disclosed
US-20030129526-A1 Containing acid curable polymer, acid generator and infrared radiation absorberr KODAK POLYCHROME GRAPHICS, L.L.C. 2003-07-10 — — US disclosed
US-20030113655-A1 Acid curable composition of an acid generator; an infrared absorber; and optional colorant KODAK POLYCHROME GRAPHICS, L.L.C 2003-06-19 — — US disclosed
WO-2003019294-A1 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID KODAK POLYCHROME GRAPHICS, L.L.C. (US) 2003-03-06 — — WO disclosed
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