Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 8/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.48 |
| ▸ | BAX | Q07812 | 1/20 | 0.48 |
| ▸ | MAOA | P21397 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | MGLL | Q99685 | 1/20 | 0.42 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.41 |
| ▸ | SOS1 | Q07889 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.41 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | SCN4A | P35499 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.39 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6291052 | 0.98 | LTA4H (0.57) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL28476939 | 0.90 | LTA4H (0.48) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL14848539 | 0.88 | ALDH1A1 (0.41) | LTA4HTSHRNR1H2BAXMAOA | |
| Sulfuric Acid SCHEMBL5678657 | 0.86 | SOS1 (0.52) | LTA4HTSHRNR1H2BAXMAOA | |
| Sulfuric Acid SCHEMBL5678661 | 0.86 | CA1 (0.47) | LTA4HTSHRNR1H2BAXMAOA | |
| Sulfuric Acid SCHEMBL5678667 | 0.83 | SOS1 (0.49) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL11871655 | 0.78 | LTA4H (0.50) | LTA4HTSHRNR1H2BAXMAOA | |
| SCHEMBL31448055 | 0.77 | SOS1 (0.44) | LTA4HTSHRSOS1SCN4AMEN1 | |
| SCHEMBL31448011 | 0.77 | TEAD4 (0.52) | TSHRCA1CA2CA9MEN1 | |
| Hydrochloric Acid SCHEMBL3796670 | 0.77 | CA4 (0.35) | TSHRCA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8703092-B2 | Type separation of single-walled carbon nanotubes via two-phase liquid extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2014-04-22 | — | — | US | disclosed |
| US-20100166637-A1 | Type Separation of Single-Walled Carbon Nanotubes via Two-Phase Liquid Extraction | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. | 2010-07-01 | — | — | US | disclosed |
| WO-2008057070-A2 | TYPE SEPARATION OF SINGLE-WALLED CARBON NANOTUBES VIA PHASE TRANSFER | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2008-05-15 | — | — | WO | disclosed |
| US-6861196-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-03-01 | — | — | US | disclosed |
| US-6821583-B2 | SUBSTRATE WITH A CROSSLINKED LAYER DISPOSED ON IT HAVING AN IMAGEABLE INK-RECEPTIVE LAYER THAT IS ABLATION FREE | KODAK POLYCHROME GRAPHICS LLC | 2004-11-23 | — | — | US | disclosed |
| US-6806020-B2 | PRINTING PLATE PATTERNS; MIXTURE OF ACID, ACID GENERATOR AND ACID CURABLE COMPOUND | KODAK POLYCHROME GRAPHICS LLC | 2004-10-19 | — | — | US | disclosed |
| US-20040063022-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC. | 2004-04-01 | — | — | US | disclosed |
| US-20040009363-A1 | Substrate with a crosslinked layer disposed on it having an imageable ink-receptive layer that is ablation free | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2004-01-15 | — | — | US | disclosed |
| US-6638679-B2 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, LLC | 2003-10-28 | — | — | US | disclosed |
| US-20030082474-A1 | Printing plate patterns; mixture of acid, acid generator and acid curable compound | KODAK POLYCHROME GRAPHICS, L.L.C | 2003-05-01 | — | — | US | disclosed |
| WO-2003019293-A1 | NEGATIVE WORKING IMAGEABLE COMPOSITION CONTAINING SULFONIC ACID | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2003-03-06 | — | — | WO | disclosed |
| WO-2003007076-A2 | PHOTOSENSITIVE COMPOSITIONS HAVING MIXTURES OF ALKOXY AND NON-ALKOXY DIAZONIUM SALT CONTAINING COMPOUNDS | KODAC POLYCHROME GRAPHICS, L.L.C. (US) | 2003-01-23 | — | — | WO | disclosed |
| US-20030013035-A1 | Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| US-20030007052-A1 | Method of preparing an inkjet ink imaged lithographic printing plate | KODAK POLYCHROME GRAPHICS, L.L.C. | 2003-01-09 | — | — | US | disclosed |
| WO-2002094571-A1 | A METHOD OF PREPARING AN INKJET INK IMAGED LITHOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 2002-11-28 | — | — | WO | disclosed |