SCHEMBL5680958

SCHEMBL5680958

C=C(C)C(=O)N(OCCCC)OCCCC

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.44
ALDH1A1 P00352 1/20 0.43
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.36
CES2 O00748 1/20 0.34
THRB P10828 1/20 0.33
HCAR2 Q8TDS4 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
NAAA Q02083 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8734465 0.82 ALDH1A1 (0.38) TSHRALDH1A1HPGDATMHCAR2
SCHEMBL238944 0.82 TSHR (0.43) TSHRALDH1A1HPGDATMCES2
SCHEMBL17350179 0.81 TSHR (0.42) TSHRALDH1A1HPGDATMCES2
SCHEMBL8040583 0.79 TSHR (0.41) TSHRALDH1A1HPGDATMCES2
SCHEMBL8051943 0.79 TSHR (0.33) TSHRALDH1A1THRB
SCHEMBL2209303 0.79 THRB (0.38) TSHRALDH1A1THRBTDP1
SCHEMBL20357559 0.74 TSHR (0.51) TSHRALDH1A1CES2THRBHCAR2
SCHEMBL1142187 0.73 TSHR (0.42) TSHRALDH1A1HPGDATMCES2
SCHEMBL17139823 0.72 ALDH1A1 (0.43) TSHRALDH1A1HPGDATMCES2
SCHEMBL25289740 0.72 TSHR (0.41) TSHRALDH1A1HPGDATMCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0859403-B9 Pressure sensitive adhesive composition for the polishing of the back of a wafer LINTEC CORP (JP) 2006-03-22 EP disclosed
EP-0859403-B1 Pressure sensitive adhesive composition for the polishing of the back of a wafer LINTEC CORP (JP) 2005-11-16 EP disclosed
US-6255423-B1 PRESSURE SENSITIVE ADHESIVE SHEET COMPRISING SUBSTRATE WITH SUPERIMPOSED ADHESIVE LAYER COMPRISING CARBOXYL GROUP CONTAINING COPOLYMER OBTAINED BY SOLUTION POLYMERIZATION, NEUTRALIZER CONTAINING NEITHER METAL NOR HALOGEN, CURING AGENT LINTEC CORPORATION (JP) 2001-07-03 US disclosed
US-6180742-B1 CARBOXY COPOLYMER, NEUTRALIZER AND CROSSLINKER LINTEC CORPORATION (JP) 2001-01-30 US disclosed
US-6040048-A BEAM CURABLE PRESSURE SENSITIVE ADHESIVE LINTEC CORPORATION (JP) 2000-03-21 US disclosed
EP-0899316-A1 Energy beam curable hydrophilic pressure sensitive adhesive composition and use thereof Lintec Corporation (JP) 1999-03-03 EP disclosed
EP-0859403-A1 Pressure sensitive adhesive composition for the polishing of the back of a wafer Lintec Corporation (JP) 1998-08-19 EP disclosed