Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20357559 | 0.93 | TSHR (0.51) | TSHRALDH1A1CES2THRBHCAR2 | |
| SCHEMBL8040583 | 0.87 | TSHR (0.41) | TSHRALDH1A1HPGDATMCES2 | |
| SCHEMBL5680958 | 0.81 | TSHR (0.44) | TSHRALDH1A1HPGDATMCES2 | |
| SCHEMBL17350614 | 0.80 | THRB (0.35) | TSHRALDH1A1THRB | |
| SCHEMBL238944 | 0.79 | TSHR (0.43) | TSHRALDH1A1HPGDATMCES2 | |
| SCHEMBL17350254 | 0.74 | TSHR (0.48) | TSHRALDH1A1HPGDATMTHRB | |
| SCHEMBL17350227 | 0.74 | TSHR (0.38) | TSHRALDH1A1THRB | |
| SCHEMBL12534527 | 0.74 | ALDH1A1 (0.37) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL27543532 | 0.74 | TSHR (0.39) | TSHRALDH1A1HPGDATMCES2 | |
| SCHEMBL12534530 | 0.72 | TSHR (0.39) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| CN-110462797-B | Polishing composition | 福吉米株式会社 | 2023-09-22 | — | — | CN | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-10745588-B2 | Silicon wafer polishing composition | FUJIMI INCORPORATED (JP) | 2020-08-18 | — | — | US | disclosed |
| EP-3007213-B1 | USE OF A COMPOSITION FOR SILICON WAFER POLISHING | FUJIMI INC (JP) | 2020-03-18 | — | — | EP | disclosed |
| WO-2020032173-A1 | ACRYLIC COPOLYMER AND RUBBER MATERIAL | 株式会社大阪ソーダ | 2020-02-13 | — | — | WO | disclosed |
| EP-3605588-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-3159915-A1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | Fujimi Incorporated (JP) | 2017-04-26 | — | — | EP | disclosed |
| EP-3133638-A1 | COMPOSITION FOR POLISHING SILICON WAFERS | Fujimi Incorporated (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-3133639-A1 | COMPOSITION FOR POLISHING SILICON WAFERS | Fujimi Incorporated (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-9566685-B2 | Polishing composition and method for producing polished article | FUJIMI INCORPORATED (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160122591-A1 | SILICON WAFER POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2016-05-05 | — | — | US | disclosed |
| EP-3007213-A1 | COMPOSITION FOR SILICON WAFER POLISHING | Fujimi Incorporated (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-20160001416-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |