SCHEMBL5681465

SCHEMBL5681465

C=CC(=O)Oc1cc(S(N)(=O)=O)cc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.44
▸ MEN1 O00255 6/20 0.42
▸ KMT2A Q03164 6/20 0.42
▸ CA2 P00918 6/20 0.40
▸ HCRTR1 O43613 1/20 0.38
▸ CA9 Q16790 5/20 0.37
▸ CA1 P00915 4/20 0.37
▸ CA12 O43570 3/20 0.37
▸ TYMS P04818 1/20 0.37
▸ MAPT P10636 5/20 0.37
▸ POLB P06746 2/20 0.37
▸ CYP1A2 P05177 2/20 0.37
▸ TDP1 Q9NUW8 2/20 0.37
▸ CYP3A4 P08684 2/20 0.37
▸ USP2 O75604 1/20 0.37
▸ STAT6 P42226 1/20 0.37
▸ HIF1A Q16665 1/20 0.37
▸ GLO1 Q04760 1/20 0.36
▸ NCEH1 Q6PIU2 1/20 0.36
▸ THRA P10827 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6852401 0.87 KMT2A (0.36) LMNAMEN1KMT2ACA2HCRTR1
SCHEMBL9568593 0.83 L3MBTL1 (0.48) MEN1KMT2AHCRTR1TYMSTDP1
SCHEMBL397324 0.81 MEN1 (0.42) LMNAMEN1KMT2ACA2HCRTR1
SCHEMBL9568793 0.80 HSD17B10 (0.40) LMNAMEN1KMT2AHCRTR1MAPT
SCHEMBL12245556 0.80 KMT2A (0.44) MEN1KMT2ATYMSMAPTCYP1A2
SCHEMBL819462 0.78 GPR84 (0.49) MEN1KMT2ATYMSMAPTCYP1A2
SCHEMBL8390017 0.77 CA1 (0.48) LMNAMEN1KMT2ACA2CA9
SCHEMBL29374139 0.75 ALDH1A1 (0.56) MEN1KMT2ATYMSMAPTPOLB
SCHEMBL68437 0.75 ALDH1A1 (0.56) MEN1KMT2ATYMSMAPTPOLB
SCHEMBL27766457 0.74 NCEH1 (0.46) LMNAMEN1KMT2ATYMSMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1110719-B1 Heat-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2006-03-01 — — EP disclosed
EP-1219668-B1 Process for producing fine polymer particles and lithographic printing plate precursor containing the same FUJI PHOTO FILM CO LTD (JP) 2005-10-26 — — EP disclosed
US-6808863-B2 MULTILAYER; SUPPORT, INK RECEPTIVE LAYER AND WATER RECEPTIVE LAYER FUJI PHOTO FILM CO., LTD. (JP) 2004-10-26 — — US disclosed
EP-1038666-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2004-09-22 — — EP disclosed
US-20020182529-A1 Producing hydrophobic polymer fine particles having a highly hydrophilic surface. FUJIFILM CORPORATION (JP) 2002-12-05 — — US disclosed
US-6455222-B1 PRECURSOR COMPRISING SUBSTRATE HAVING IMAGE RECORDING LAYER CONTAINING FINE LIGHT-HEAT CONVERTIBLE PARTICLES COATED WITH HYDROPHILIC MATERIAL, WHICH CAN BE MADE HYDROPHOBIC BY HEATING FUJI PHOTO FILM CO., LTD. (JP) 2002-09-24 — — US disclosed
EP-1219668-A2 Process for producing fine polymer particles and lithographic printing plate precursor containing the same FUJI PHOTO FILM CO., LTD. (JP) 2002-07-03 — — EP disclosed
US-20010008740-A1 Heat-sensitive lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2001-07-19 — — US disclosed
EP-1110719-A2 Heat-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-06-27 — — EP disclosed
EP-1038666-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 — — EP disclosed
EP-0544264-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-06-02 — — EP disclosed
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