SCHEMBL56816

SCHEMBL56816

CC(CC(C)(CO)CO)=C(C)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
ADRA1A P35348 1/20 0.32
CYP2D6 P10635 1/20 0.31
TSHR P16473 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31
TET2 Q6N021 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3080795 0.78 HMGCR (0.36) HMGCRCHRM1TBXA2RADRA1ACYP2D6
SCHEMBL10357807 0.76 THRB (0.30)
SCHEMBL4804997 0.72 HMGCR (0.52) HMGCRCHRM1TBXA2RADRA1ACYP2D6
SCHEMBL27504045 0.72 ALDH1A1 (0.35) HMGCRCHRM1TBXA2RADRA1ACYP2D6
Acetic Acid SCHEMBL3199105 0.72 FFAR3 (0.47) HMGCRCHRM1TBXA2RADRA1ACYP2D6
Acetic Acid SCHEMBL11514854 0.72 FFAR3 (0.47) HMGCRCHRM1TBXA2RADRA1ACYP2D6
SCHEMBL14348251 0.71 THRB (0.30)
SCHEMBL5705064 0.71 HMGCR (0.31) HMGCRCHRM1TBXA2RADRA1ACYP2D6
SCHEMBL6803519 0.70 TET2 (0.56) HMGCRCHRM1TBXA2RADRA1ACYP2D6
Methacrylic Acid SCHEMBL28826775 0.70 TET2 (0.32) TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728355-B2 Electrode and method for manufacturing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2014-05-20 US disclosed
US-8709294-B2 Electrode and method for manufacturing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2014-04-29 US disclosed
US-20130026424-A1 ELECTRODE AND METHOD FOR MANUFACTURING THE SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2013-01-31 US disclosed
US-20130017483-A1 ELECTRODE AND METHOD FOR MANUFACTURING THE SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2013-01-17 US disclosed
EP-2449571-A1 ELECTRODE AND METHOD OF MANUFACTURING THE SAME E.I. Du Pont De Nemours And Company (US) 2012-05-09 EP disclosed
US-8129088-B2 Electrode and method for manufacturing the same E.I. DU PONT DE NEMOURS AND COMPANY (US) 2012-03-06 US disclosed
US-20110003246-A1 ELECTRODE AND METHOD FOR MANUFACTURING THE SAME E.I. DU PONT DE NEMOURS AND COMPANY (US) 2011-01-06 US disclosed
WO-2011002964-A1 ELECTRODE AND METHOD OF MANUFACTURING THE SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-01-06 WO disclosed
EP-1950766-A2 A conductive composition ansd a rear substrate of a plasma display E.I. DU PONT DE NEMOURS AND COMPANY (US) 2008-07-30 EP disclosed
US-20070001607-A1 Method for manufacturing a conductive composition and a rear substrate of a plasma display DUPONT KABUSHIKI KAISHA (DKK) (JP) 2007-01-04 US disclosed
EP-1739688-A1 Method for manufacturing a conductive composition and a rear substrate of a plasma display E.I. DUPONT DE NEMOURS AND COMPANY (US) 2007-01-03 EP disclosed