SCHEMBL5683104

SCHEMBL5683104

O=S(=O)(O)OC(O)[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.[NaH]

nearest known ligand 0.48

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.48
LMNA P02545 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
MGAM O43451 3/20 0.40
PDE4A P27815 1/20 0.38
USP2 O75604 1/20 0.35
SLCO1B1 Q9Y6L6 1/20 0.35
KDM4E B2RXH2 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28256211 0.98 TDP1 (0.50) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL8641932 0.83 TDP1 (0.52) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL28256272 0.83 TDP1 (0.52) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL8157521 0.80 TDP1 (0.48) TDP1LMNAL3MBTL1MGAMPDE4A
Sorbitol SCHEMBL628565 0.78 LMNA (0.65) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL7590412 0.78 LMNA (0.46) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL14413769 0.75 MGAM (0.42) TDP1LMNAL3MBTL1MGAMPDE4A
SCHEMBL14377638 0.75 MGAM (0.42) TDP1LMNAL3MBTL1MGAMPDE4A
Mannitol SCHEMBL20572201 0.75 LMNA (0.69) TDP1LMNAL3MBTL1MGAMPDE4A
Sorbitol SCHEMBL3227835 0.75 LMNA (0.69) TDP1LMNAL3MBTL1MGAMPDE4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1213316-B1 Polyhydric alcohol-modified silicone and cosmetic material containing same SHINETSU CHEMICAL CO (JP) 2006-03-08 EP disclosed
US-7001971-B2 Polyhydric alcohol-modified silicone and cosmetic material containing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-02-21 US disclosed
EP-1213316-A2 Polyhydric alcohol-modified silicone and cosmetic material containing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-12 EP disclosed