SCHEMBL5697665

SCHEMBL5697665

CC(C)(C)OC(=O)COc1ccc2ccccc2c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN7 P35236 1/20 0.61
RAB9A P51151 3/20 0.56
MEN1 O00255 4/20 0.55
KMT2A Q03164 4/20 0.55
HTT P42858 3/20 0.55
PPARG P37231 3/20 0.55
NCOA2 Q15596 3/20 0.55
NCOA1 Q15788 3/20 0.55
NCOA3 Q9Y6Q9 3/20 0.55
NPSR1 Q6W5P4 1/20 0.55
NR2E3 Q9Y5X4 1/20 0.55
NCOR2 Q9Y618 1/20 0.55
ALDH1A1 P00352 2/20 0.53
HPGD P15428 2/20 0.51
NPC1 O15118 1/20 0.51
PSEN1 P49768 1/20 0.51
PSEN2 P49810 1/20 0.51
APH1B Q8WW43 1/20 0.51
NCSTN Q92542 1/20 0.51
APH1A Q96BI3 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18286157 0.85 KMT2A (0.47) PTPN7RAB9AMEN1KMT2AHTT
SCHEMBL17024452 0.83 LMNA (0.53) KMT2APPARGNPSR1ALDH1A1HPGD
SCHEMBL17094885 0.82 RAB9A (0.44) PTPN7RAB9AMEN1KMT2ANPSR1
SCHEMBL2474817 0.82 PTPN7 (0.67) PTPN7RAB9AMEN1KMT2AHTT
SCHEMBL30360394 0.82 PTPN7 (0.67) PTPN7RAB9AMEN1KMT2AHTT
SCHEMBL2448079 0.82 ALOX15 (0.57) RAB9AMEN1KMT2ANPSR1ALDH1A1
SCHEMBL27194588 0.81 PTPN7 (0.76) PTPN7RAB9AMEN1KMT2AHTT
SCHEMBL22000631 0.79 MAPT (0.63) RAB9AKMT2ANPSR1ALDH1A1HPGD
SCHEMBL30737444 0.79 LMNA (0.50) RAB9ANPSR1ALDH1A1HPGDNPC1
SCHEMBL26691695 0.79 MAPT (0.50) RAB9AMEN1KMT2ANPSR1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1441256-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-05-31 EP disclosed
EP-0789278-B1 Radiation-sensitive resin composition JSR CORP (JP) 2005-05-04 EP disclosed
EP-1441256-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2004-07-28 EP disclosed
US-6727032-B1 USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. JSR CORPORATION (JP) 2004-04-27 US disclosed
US-6692887-B1 COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY JSR CORPORATION (JP) 2004-02-17 US disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed