SCHEMBL5698294

SCHEMBL5698294

O=C(O)C(=Cc1cccc2ccccc12)CO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.52
ALDH1A1 P00352 2/20 0.48
MAPT P10636 2/20 0.48
HPGD P15428 2/20 0.48
MEN1 O00255 1/20 0.48
GAA P10253 1/20 0.48
CRHBP P24387 1/20 0.48
HTT P42858 1/20 0.48
KMT2A Q03164 1/20 0.48
CRHR2 Q13324 1/20 0.48
SMPD2 O60906 2/20 0.45
HDAC8 Q9BY41 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
MTNR1A P48039 1/20 0.43
MTNR1B P49286 1/20 0.43
TDP1 Q9NUW8 1/20 0.42
NR4A1 P22736 1/20 0.42
NR4A2 P43354 1/20 0.42
NR4A3 Q92570 1/20 0.42
GRIK1 P39086 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3817099 0.85 KDM4E (0.55) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL3817101 0.85 KDM4E (0.55) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL5698254 0.85 KDM4E (0.44) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL7328215 0.85 KDM4E (0.51) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL8865007 0.85 KDM4E (0.55) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL563351 0.85 KDM4E (0.51) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL7328223 0.85 KDM4E (0.51) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL7971777 0.85 KDM4E (0.55) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL8865001 0.85 KDM4E (0.55) KDM4EALDH1A1MAPTHPGDMEN1
SCHEMBL7275466 0.84 KDM4E (0.50) KDM4EALDH1A1MAPTHPGDMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8715898-B2 Electrostatic charge image developer, process cartridge, image forming apparatus, and image forming method FUJI XEROX CO., LTD. (JP) 2014-05-06 US claimed
US-20130252166-A1 ELECTROSTATIC CHARGE IMAGE DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD FUJI XEROX CO., LTD. (JP) 2013-09-26 US claimed
US-9459535-B2 Method of forming pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2016-10-04 US disclosed
US-9134617-B2 Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer TOKYO OHKA KOGYO CO., LTD. (JP) 2015-09-15 US disclosed
US-8715898-B2 Electrostatic charge image developer, process cartridge, image forming apparatus, and image forming method FUJI XEROX CO., LTD. (JP) 2014-05-06 US disclosed
US-20130337387-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHTA KOGYO CO., LTD. (JP) 2013-12-19 US disclosed
US-20130252166-A1 ELECTROSTATIC CHARGE IMAGE DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD FUJI XEROX CO., LTD. (JP) 2013-09-26 US disclosed
US-20130209941-A1 METHOD OF FORMING PATTERN TOKYO ELECTRON LIMITED (JP) 2013-08-15 US disclosed
EP-0933682-B1 Radiation-sensitive compositions with binders of polymers comprising N-substituted maleimide units AGFA GEVAERT (BE) 2006-08-09 EP disclosed
EP-0933682-A2 Polymers comprising N-substituted maleimide units and their use in radiation-sensitive compositions Agfa-Gevaert AG (DE) 1999-08-04 EP disclosed