Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | FYN | P06241 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 1/20 | 0.35 |
| ▸ | RNPEP | Q9H4A4 | 1/20 | 0.35 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL3289518 | 0.92 | TSHR (0.41) | TSHRFFAR3LCKFYNALDH1A1 | |
| 1,3-Propanediol SCHEMBL7196243 | 0.88 | TSHR (0.39) | TSHRFFAR3LCKFYNALDH1A1 | |
| SCHEMBL25350353 | 0.86 | TSHR (0.39) | TSHRALDH1A1L3MBTL1KDM4ERNPEP | |
| Methacrylic Acid SCHEMBL3647935 | 0.85 | TSHR (0.56) | TSHRALDH1A1TDP1CYP2D6CYP2C19 | |
| Succinic Acid SCHEMBL2961965 | 0.83 | EGLN1 (0.47) | TSHRFFAR3KDM4E | |
| Acetoacetic Acid SCHEMBL29569084 | 0.83 | TSHR (0.39) | TSHRALDH1A1TDP1CYP2D6CYP2C19 | |
| Acetic Acid SCHEMBL29139328 | 0.82 | L3MBTL1 (0.42) | TSHRALDH1A1TDP1L3MBTL1KDM4E | |
| Urea SCHEMBL8376677 | 0.82 | TSHR (0.41) | TSHRALDH1A1TDP1L3MBTL1KDM4E | |
| SCHEMBL26725017 | 0.81 | TSHR (0.41) | TSHRALDH1A1TDP1L3MBTL1KDM4E | |
| Methyl Alcohol SCHEMBL28414164 | 0.81 | ALDH1A1 (0.38) | TSHRALDH1A1L3MBTL1KDM4ECTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117413022-A | Composition, method for producing cured product, and cured product | 株式会社ADEKA | 2024-01-16 | — | — | CN | disclosed |
| CN-110168054-B | Polymer for liquid crystal aligning agent, liquid crystal aligning agent comprising same, and liquid crystal alignment film and liquid crystal display device using same | 株式会社LG化学 | 2023-02-17 | — | — | CN | disclosed |
| CN-115151609-A | Polyimide varnish | 日产化学株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-102257579-A | Composition for thick superconductive oxide film, and process for producing thick-film-tape-like superconductive oxide material using same | ADEKA CORP | 2011-11-23 | — | — | CN | disclosed |
| EP-1674919-A1 | SEALANT FOR LIQUID CRYSTAL, LIQUID-CRYSTAL DISPLAY MADE WITH THE SAME, AND PROCESS FOR PRODUICNG THE DISPLAY | Nippon Kayaku Kabushiki Kaisha (JP) | 2006-06-28 | — | — | EP | disclosed |
| EP-0853116-B1 | Detergent composition for removing resinous stains | KAO CORP (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-5954891-A | ANTISOILANTS OF NONIONIC DETERGENTS ADHERED USING THE DETERGENT COMPOSITION AS DEFINED IN CLAIM 1 OR 2; | KAO CORPORATION (JP) | 1999-09-21 | — | — | US | disclosed |
| EP-0853116-A1 | Detergent composition for removing resinous stains | KAO CORPORATION (JP) | 1998-07-15 | — | — | EP | disclosed |