Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | DAO | P14920 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.35 |
| ▸ | MMP12 | P39900 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
| ▸ | MMP13 | P45452 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL31398487 | 0.96 | DAO (0.45) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL29051656 | 0.87 | SMN1; SMN2 (0.44) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL3660464 | 0.87 | DAO (0.39) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL10385894 | 0.86 | DAO (0.49) | ALDH1A1SMN1; SMN2MAPK1DAOMEN1 | |
| SCHEMBL9564682 | 0.85 | HPGD (0.40) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL5367666 | 0.84 | DAO (0.39) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL10383861 | 0.84 | HPGD (0.39) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO | |
| SCHEMBL1290533 | 0.82 | SMN1; SMN2 (0.43) | ALDH1A1SMN1; SMN2MAPK1TSHRKDM4E | |
| SCHEMBL7559724 | 0.82 | ALDH1A1 (0.43) | ALDH1A1SMN1; SMN2MAPK1TSHRKDM4E | |
| SCHEMBL28245381 | 0.81 | SMN1; SMN2 (0.37) | ALDH1A1SMN1; SMN2MAPK1TSHRDAO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5925 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080305-A | Polyacrylonitrile microchannel preparation method | — | 2026-05-26 | — | — | CN | claimed |
| EP-3685231-B1 | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES | THE REGENTS OF THE UNIV OF COLORADO A BODY CORPORATE A COLORADO NON PROFIT (US) | 2026-05-13 | — | — | EP | claimed |
| WO-2025235504-A1 | COMPOSITIONS AND METHODS FOR TREATING DENTAL HYPERSENSITIVITY | COLGATE-PALMOLIVE COMPANY (US) | 2025-11-13 | — | — | WO | claimed |
| US-12377188-B2 | Double-crosslinked fibrin gel, raw material composition and kit thereof, and application thereof | ZHEJIANG UNIVERSITY (CN) | 2025-08-05 | — | — | US | claimed |
| WO-2025108043-A1 | LIGNIN-BASED ACRYLATE PREPOLYMER, COMPOSITE PREPOLYMER, ADHESIVE COMPOSITION, PREPARATION METHOD, AND USE | 中国石油化工股份有限公司 | 2025-05-30 | — | — | WO | claimed |
| WO-2025092692-A1 | INK COMPOSITION, INK, AND PREPARATION METHOD AND USE THEREFOR | 长胜纺织科技发展(上海)有限公司 | 2025-05-08 | — | — | WO | claimed |
| CN-119747185-A | Photo-curing organic silicon/SiO with micro/nano mastoid structure2Preparation method of super-hydrophobic coating | 浙江理工大学 | 2025-04-04 | — | — | CN | claimed |
| US-20250108143-A1 | DOUBLE-CROSSLINKED FIBRIN GEL, RAW MATERIAL COMPOSITION AND KIT THEREOF, AND APPLICATION THEREOF | ZHEJIANG UNIVERSITY (CN) | 2025-04-03 | — | — | US | claimed |
| CN-119708913-A | Temperature-variable ink, preparation method thereof and printed matter | 当纳利(广东)印务有限公司 | 2025-03-28 | — | — | CN | claimed |
| EP-3932671-B1 | DUAL-CURING PHASE SEPARATION TYPE CONTINUOUS 3D PRINTING HIGH-PRECISION PHOTOSENSITIVE RESIN COMPOSITION | SUZHOU POLLY NEW MAT TECH CO LTD (CN) | 2025-03-19 | — | — | EP | claimed |
| EP-1770119-A1 | Crosslinkabe elastomer compositions, process for preparation, and use thereof | Lanxess Deutschland GmbH (DE) | 2007-04-04 | — | — | EP | claimed |
| WO-2006046864-A1 | PHOTOCURABLE RESIN COMPOSITION AND OPTICAL DISK ADHESIVE | JSR CORPORATION (JP) | 2006-05-04 | — | — | WO | claimed |
| EP-1000385-B1 | METHOD AND SYSTEM FOR PRODUCING ACTIVATING LIGHT ABSORBING LENSES | Q2100 INC (US) | 2004-04-28 | — | — | EP | claimed |
| US-20030013780-A1 | Polyolefin materials having enhanced surface durability and methods of making the same by exposure to radiation | SOLVAY ENGINEERED POLYMERS, INC. | 2003-01-16 | — | — | US | claimed |
| US-6488882-B2 | CURING A BASE COMPONENT OF A THERMOPLASTIC POLYOLEFIN, A RADIATION-CROSSLINKABLE COMPONENT TO INCREASE THE SURFACE DURABILITY AND A PHOTOINITIATOR TO INITIATE THE CROSSLINKING; SURFACE TREATMENT; WEAR RESISTANCE | SOLVAY ENGINEERED POLYMERS | 2002-12-03 | — | — | US | claimed |
| US-20010020047-A1 | Polyolefin materials having enhanced surface durability and methods of making the same by exposure to radiation | SOLVAY ENGINEERED POLYMERS, INC. | 2001-09-06 | — | — | US | claimed |
| EP-0921152-A2 | Polyolefin materials having enhanced surface durability and methods of making the same by exposure to radiation | Ciba SC Holding AG (CH) | 1999-06-09 | — | — | EP | claimed |
| EP-0902327-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-03-17 | — | — | EP | claimed |
| US-5847015-A | Pigment-dispersed radiation-sensitive composition for color filters | JSR CORPORATION (JP) | 1998-12-08 | — | — | US | claimed |
| EP-0645678-B1 | Radiation-sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-03-04 | — | — | EP | claimed |