Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 2/20 | 0.41 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 9/20 | 0.34 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL29839677 | 0.88 | GPR3 (0.36) | GPR3EPAS1KCNH2POLBPTGS1 | |
| Toliodium SCHEMBL2898696 | 0.80 | GPR3 (0.44) | GPR3KCNH2ACHEALDH1A1FFAR4 | |
| Trifluoromethanesulfonic Acid SCHEMBL31322589 | 0.79 | FFAR4 (0.35) | GPR3ACHEPTGS1PTGS2FFAR4 | |
| Trifluoromethanesulfonic Acid SCHEMBL29443425 | 0.78 | GPR3 (0.40) | GPR3EPAS1KCNH2ACHEPTGS1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8736577 | 0.78 | GPR3 (0.47) | GPR3KCNH2ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL30677458 | 0.77 | SLC22A12 (0.32) | GPR3EPAS1PTGS2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2903904 | 0.76 | TDP1 (0.44) | GPR3EPAS1KCNH2ALDH1A1POLB | |
| Trifluoromethanesulfonic Acid SCHEMBL30536254 | 0.74 | GPR3 (0.40) | GPR3EPAS1KCNH2ACHEPTGS1 | |
| Trifluoromethanesulfonic Acid SCHEMBL2851342 | 0.74 | GPR3 (0.47) | GPR3KCNH2ACHEALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL29462458 | 0.74 | RAPGEF4 (0.41) | GPR3KCNH2FFAR4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1011029-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |