SCHEMBL5709595

SCHEMBL5709595

Cc1ccc(S(=O)(=O)Oc2ccc(OS(=O)(=O)c3ccc(C)cc3)c(S(=O)(=O)OS(c3ccccc3)(c3ccccc3)c3ccccc3)c2)cc1

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
TDP1 Q9NUW8 4/20 0.45
LMNA P02545 3/20 0.45
HTT P42858 3/20 0.45
L3MBTL1 Q9Y468 3/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
MAOB P27338 2/20 0.44
ALDH1A1 P00352 4/20 0.44
MAPT P10636 4/20 0.44
NPSR1 Q6W5P4 3/20 0.44
PKM P14618 1/20 0.44
MAPK1 P28482 2/20 0.43
PTPN1 P18031 1/20 0.42
ENPP2 Q13822 1/20 0.42
GAA P10253 2/20 0.42
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
HPGD P15428 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5709635 0.95 KMT2A (0.51) MEN1KMT2ATDP1LMNAHTT
SCHEMBL28923304 0.88 MEN1 (0.48) MEN1KMT2ATDP1LMNAHTT
SCHEMBL5709680 0.87 HSD11B1 (0.47) MEN1KMT2AHTTL3MBTL1ALDH1A1
SCHEMBL482593 0.86 TDP1 (0.54) MEN1KMT2ATDP1LMNAHTT
SCHEMBL5709637 0.86 TDP1 (0.54) MEN1KMT2ATDP1LMNAHTT
SCHEMBL6742766 0.84 MEN1 (0.56) MEN1KMT2ATDP1LMNAHTT
SCHEMBL6741643 0.84 MEN1 (0.56) MEN1KMT2ATDP1LMNAHTT
SCHEMBL6742535 0.83 KMT2A (0.53) MEN1KMT2ATDP1LMNAHTT
SCHEMBL6743673 0.83 KMT2A (0.53) MEN1KMT2ATDP1LMNAHTT
SCHEMBL7112625 0.81 ALDH1A1 (0.56) MEN1KMT2ATDP1LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed