SCHEMBL5709652

SCHEMBL5709652

O=S(=O)(O)c1cc(OS(=O)(=O)c2ccccc2)ccc1OS(=O)(=O)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.51
MAOB P27338 2/20 0.48
MAPT P10636 2/20 0.47
SMN1; SMN2 Q16637 5/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
LMNA P02545 1/20 0.45
HTT P42858 1/20 0.45
ALDH1A1 P00352 2/20 0.45
ENPP3 O14638 4/20 0.44
ENPP1 P22413 4/20 0.44
ENPP2 Q13822 3/20 0.43
TSHR P16473 1/20 0.42
GAA P10253 1/20 0.42
MAPK1 P28482 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
CA12 O43570 1/20 0.42
CA2 P00918 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL342714 0.84 KMT2A (0.56) MAPTL3MBTL1LMNAHTTALDH1A1
SCHEMBL6307152 0.84 LMNA (0.57) TDP1MAOBSMN1; SMN2L3MBTL1LMNA
SCHEMBL4077813 0.83 KMT2A (0.55) MAPTL3MBTL1LMNAHTTALDH1A1
SCHEMBL2057733 0.83 TDP1 (0.58) TDP1MAOBMAPTSMN1; SMN2L3MBTL1
SCHEMBL2065834 0.78 TDP1 (0.65) TDP1MAOBMAPTSMN1; SMN2L3MBTL1
SCHEMBL6742808 0.77 SMN1; SMN2 (0.60) TDP1MAOBMAPTSMN1; SMN2L3MBTL1
SCHEMBL6741550 0.77 MEN1 (0.46) TDP1MAPTSMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL28923304 0.77 MEN1 (0.48) TDP1MAOBMAPTSMN1; SMN2L3MBTL1
SCHEMBL11496645 0.76 TDP1 (0.51) TDP1MAOBMAPTSMN1; SMN2L3MBTL1
SCHEMBL5709595 0.76 MEN1 (0.47) TDP1MAOBMAPTSMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed