SCHEMBL6307152

SCHEMBL6307152

COc1ccc(S(=O)(=O)Oc2ccc(OS(=O)(=O)c3ccc(OC)cc3)c(S(=O)(=O)O)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.57
HTT P42858 1/20 0.57
SMN1; SMN2 Q16637 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
L3MBTL1 Q9Y468 1/20 0.57
TUBB4A P04350 1/20 0.50
TUBB P07437 1/20 0.50
TUBA3C P0DPH7 1/20 0.50
TUBA1B P68363 1/20 0.50
TUBA4A P68366 1/20 0.50
TUBB4B P68371 1/20 0.50
TUBB3 Q13509 1/20 0.50
TUBB2A Q13885 1/20 0.50
TUBB8 Q3ZCM7 1/20 0.50
TUBA3E Q6PEY2 1/20 0.50
TUBA1A Q71U36 1/20 0.50
TUBA1C Q9BQE3 1/20 0.50
TUBB6 Q9BUF5 1/20 0.50
TUBB2B Q9BVA1 1/20 0.50
TUBB1 Q9H4B7 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL342714 0.88 KMT2A (0.56) LMNAHTTL3MBTL1KMT2AGAA
SCHEMBL4077813 0.87 KMT2A (0.55) LMNAHTTL3MBTL1KMT2AGAA
SCHEMBL2065787 0.86 L3MBTL1 (0.59) LMNAHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL5709652 0.84 TDP1 (0.51) LMNAHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL5709611 0.80 LMNA (0.58) LMNAHTTSMN1; SMN2TDP1L3MBTL1
SCHEMBL30965843 0.79 L3MBTL1 (0.64) LMNASMN1; SMN2L3MBTL1KMT2AGAA
SCHEMBL668653 0.79 L3MBTL1 (0.64) LMNASMN1; SMN2L3MBTL1KMT2AGAA
SCHEMBL8818892 0.78 TDP1 (0.68) LMNAHTTSMN1; SMN2TDP1L3MBTL1
Hydrochloric Acid SCHEMBL27876200 0.77 L3MBTL1 (0.62) LMNASMN1; SMN2L3MBTL1KMT2AGAA
SCHEMBL9308804 0.77 TDP1 (0.73) LMNAHTTSMN1; SMN2TDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH LMNA 2395/4885HTT 3448/4885SMN1; SMN2 1941/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.