Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.45 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.45 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 7/20 | 0.45 |
| ▸ | BLM | P54132 | 3/20 | 0.45 |
| ▸ | THRB | P10828 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.45 |
| ▸ | PLG | P00747 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | RECQL | P46063 | 2/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | GABRR3 | A8MPY1 | 1/20 | 0.43 |
| ▸ | GABRP | O00591 | 1/20 | 0.43 |
| ▸ | GABRD | O14764 | 1/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.43 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4186141 | 0.93 | KDM5A (0.45) | NFKB1CYP2D6LMNABLMTHRB | |
| SCHEMBL9062020 | 0.86 | ALOX5 (0.39) | CYP2D6LMNAKMT2APLGMEN1 | |
| Bicarbonate SCHEMBL25268053 | 0.85 | CYP2D6 (0.48) | CYP2D6LMNAPLGGABRR1GABRR2 | |
| Adipic Acid SCHEMBL11871671 | 0.83 | LMNA (0.58) | NFKB1CYP2D6LMNABLMTHRB | |
| SCHEMBL7448393 | 0.82 | CYP2D6 (0.43) | CYP2D6LMNAPLGALDH1A1GABRA1 | |
| SCHEMBL6722155 | 0.78 | LMNA (0.44) | NFKB1CYP2D6LMNABLMTHRB | |
| SCHEMBL1421999 | 0.78 | LMNA (0.47) | NFKB1CYP2D6LMNABLMTHRB | |
| SCHEMBL7135021 | 0.78 | EPHX2 (0.39) | CYP2D6LMNAPLGPLAT | |
| SCHEMBL1703647 | 0.78 | EPHX2 (0.39) | CYP2D6LMNAPLGPLAT | |
| SCHEMBL26661 | 0.78 | EPHX2 (0.39) | CYP2D6LMNAPLGPLAT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11971658-B2 | Ablation layer, photosensitive resin structure, method for producing relief printing plate using said photosensitive resin structure | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-04-30 | — | — | US | disclosed |
| CN-111065964-B | Water-developable photosensitive resin composition for flexographic printing and photosensitive resin precursor for flexographic printing obtained from the same | 东洋纺MC株式会社 | 2023-08-11 | — | — | CN | disclosed |
| US-11656551-B2 | Water-developable photosensitive resin composition for flexographic printing and photosensitive resin original plate for flexographic printing obtained therefrom | TOYOBO CO., LTD. (JP) | 2023-05-23 | — | — | US | disclosed |
| US-20230145446-A1 | LIGHT-SENSITIVE RESIN ORIGINAL PRINTING PLATE FOR LETTERPRESS PRINTING | TOYOBO CO., LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20230048655-A1 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, METHOD FOR PRODUCING RELIEF PRINTING PLATE USING SAID PHOTOSENSITIVE RESIN STRUCTURE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-02-16 | — | — | US | disclosed |
| EP-4130875-A1 | LIGHT-SENSITIVE RESIN ORIGINAL PRINTING PLATE FOR LETTERPRESS PRINTING | TOYOBO CO., LTD. (JP) | 2023-02-08 | — | — | EP | disclosed |
| CN-113260518-B | Flexographic printing original plate and method for producing flexographic printing plate | 旭化成株式会社 | 2023-01-31 | — | — | CN | disclosed |
| US-11500287-B2 | Ablation layer, photosensitive resin structure, method for producing relief printing plate using said photosensitive resin structure | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-11-15 | — | — | US | disclosed |
| CN-115335769-A | Photosensitive resin printing original plate for relief printing | 东洋纺株式会社 | 2022-11-11 | — | — | CN | disclosed |
| EP-3680715-B1 | WATER-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING USE, PHOTOSENSITIVE RESIN ORIGINAL PLATE FOR FLEXOGRAPHIC PRINTING USE WHICH IS PRODUCED FROM THE COMPOSITION AND ITS USE BY FLEXOGRAPHIC PRINTING WITH UV INK OR UV VANISH | TOYO BOSEKI (JP) | 2022-05-25 | — | — | EP | disclosed |
| US-20050119446-A1 | Production method of polyamide | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-06-02 | — | — | US | disclosed |
| EP-1418193-A1 | Production method of polyamides | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-05-12 | — | — | EP | disclosed |
| US-20030235780-A1 | Photosensitive plate | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2003-12-25 | — | — | US | disclosed |
| EP-1353227-A2 | Photosensitive plate | Toyo Boseki Kabushiki Kaisha (JP) | 2003-10-15 | — | — | EP | disclosed |
| CN-1365989-A | Method of producing polyamide | MITSUBISHI GAS IND LTD (JP) | 2002-08-28 | — | — | CN | disclosed |
| US-6333134-B1 | FOR PRINTING PLATE HAVING EXCELLENT PRINT QUALITY WITHOUT BEING THICKENED BY IMPRESSION | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2001-12-25 | — | — | US | disclosed |
| US-6331524-B1 | ADMINISTERING COMPLEX OF SPERMIDINE CHOLESTEROL CARBAMATE AND POLYNUCLEOTIDE ENCODING RETINOBLASTOMA PROTEIN AS ANTIPROLIFERATIVE, ANTICARCINOGENIC AND ANTITUMOR AGENTS | GENZYME CORPORATION | 2001-12-18 | — | — | US | disclosed |
| EP-0086653-B1 | PHOTOSENSITIVE RESIN COMPOSITION | Toyo Boseki Kabushiki Kaisha (JP) | 1987-02-04 | — | — | EP | disclosed |
| US-4544624-A | Photosensitive resin composition | TOYO BOSEKI KABNUSHIKI KAISHA (JP) | 1985-10-01 | — | — | US | disclosed |
| EP-0086653-A2 | Photosensitive resin composition | Toyo Boseki Kabushiki Kaisha (JP) | 1983-08-24 | — | — | EP | disclosed |