SCHEMBL580906

SCHEMBL580906

Cc1cc(Oc2cc(C)c(O)c(C)c2)cc(C)c1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
PTGS1 P23219 5/20 0.42
PTGS2 P35354 5/20 0.42
ALOX5 P09917 3/20 0.42
ALDH1A1 P00352 3/20 0.41
GAA P10253 2/20 0.39
KDM4E B2RXH2 2/20 0.39
LMNA P02545 2/20 0.39
MAPT P10636 2/20 0.39
PTPN1 P18031 2/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C9 P11712 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
ACHE P22303 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14216960 0.92 CA1 (0.48) CA1CA2ESR1ESR2PTGS1
SCHEMBL8840934 0.89 CA1 (0.50) CA1CA2ESR1ESR2PTGS1
SCHEMBL11178426 0.88 CYP3A4 (0.52) CA1CA2PTGS1PTGS2ALOX5
SCHEMBL9263309 0.86 TEAD4 (0.50) CA1CA2ESR1ESR2PTGS1
SCHEMBL11096627 0.86 MEN1 (0.61) CA1CA2ESR1ESR2PTGS1
SCHEMBL10386941 0.86 MEN1 (0.61) CA1CA2ESR1ESR2PTGS1
SCHEMBL8517685 0.86 LTA4H (0.52) CA1CA2PTGS1PTGS2ALOX5
SCHEMBL17716506 0.84 TP53 (0.46) CA1CA2ESR1ESR2PTGS1
SCHEMBL21811067 0.84 PTPN1 (0.42) CA1CA2ESR1ESR2PTGS1
SCHEMBL6234849 0.83 HSP90AA1 (0.44) CA1CA2PTGS1PTGS2ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 779 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116144029-B Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华新材料科技股份有限公司 2025-03-18 CN claimed
EP-3235850-B1 POLYCARBONATE COPOLYMER AND PREPARATION METHOD THEREFOR SAMYANG CORP (KR) 2020-02-12 EP claimed
CN-107108874-B Polycarbonate copolymer and method for producing same 株式会社三养社 2019-08-30 CN claimed
US-10081708-B2 Polycarbonate copolymer and preparation method therefor SAMYANG CORPORATION (KR) 2018-09-25 US claimed
US-20180162994-A1 Polycarbonate Copolymer And Preparation Method Therefor SAMYANG CORPORATION (KR) 2018-06-14 US claimed
EP-3235850-A1 POLYCARBONATE COPOLYMER AND PREPARATION METHOD THEREFOR Samyang Corporation (KR) 2017-10-25 EP claimed
CN-107108874-A Polycarbonate copolymer and method for producing same 株式会社三养社 2017-08-29 CN claimed
US-6576739-B2 Conversion of the hindered bisphenol to the corresponding bischloroformate and subsequent treatment with an amine catalyst and an aqueous base to effect polymerization by hydrolysis and condenstation of bischloroformate groups GENERAL ELECTRIC COMPANY 2003-06-10 US claimed
US-20020111456-A1 Method of polycarbonate preparation SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2002-08-15 US claimed
EP-0542256-B1 Polycarbonate resin solution for forming thermal-sublimating dye receiving layer film MITSUBISHI GAS CHEMICAL CO (JP) 1996-04-24 EP claimed
US-5283314-A Polymerizing an oligomer of a dihydric phenol and a branching agent with a dihydric alcohol and a monohydric phenol with stirring IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1994-02-01 US claimed
EP-0542256-A1 Polycarbonate resin solution for forming thermal-sublimating dye receiving layer film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1993-05-19 EP claimed
US-5041523-A Interfacial polycondensation using divalent phenol and branching agent IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1991-08-20 US claimed
JP-7188535-A None JP disclosed
CN-122072433-A Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device 日铁化学材料株式会社 2026-05-22 CN disclosed
CN-113050372-B Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2026-05-12 CN disclosed
US-4042567-A S-Triazine prepolymers and a process for their production BAYER AKTIENGESELLSCHAFT (DT) 1977-08-16 US disclosed
US-4028393-A Process for the production of polyfunctional cyanic acid esters BAYER AKTIENGESELLSCHAFT (DT) 1977-06-07 US disclosed
US-4005037-A Polycarbonate-polyvinyl chloride moulding compounds BAYER AKTIENGESELLSCHAFT (DT) 1977-01-25 US disclosed
US-3978028-A Process for preparing s-triazine prepolymers by condensation of an aromatic polyhydroxy compound with cyanuric chloride and thereafter reacting the condensation product with cyanogen halide in the presence of base BAYER AKTIENGESELLSCHAFT (DT) 1976-08-31 US disclosed