Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 5/20 | 0.44 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.44 |
| ▸ | GRIN1 | Q05586 | 5/20 | 0.44 |
| ▸ | GRIN2A | Q12879 | 5/20 | 0.44 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.44 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.44 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | STAT6 | P42226 | 1/20 | 0.33 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5810447 | 0.77 | HSD11B1 (0.44) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL1767805 | 0.74 | GRIN2D (0.44) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL20683106 | 0.74 | GRIN2D (0.44) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4439385 | 0.74 | GRIN2D (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| Hydrochloric Acid SCHEMBL3126803 | 0.72 | GRIN2D (0.43) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL13285044 | 0.72 | GRIN2D (0.52) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL5826990 | 0.69 | GRIN2D (0.47) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL27451158 | 0.69 | — | — | |
| SCHEMBL5822452 | 0.68 | THRB (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL5827285 | 0.67 | GRIN2D (0.50) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7067234-B2 | Chemical consolidation of photoresists in the UV range | INFINEON TECHNOLOGIES AG (DE) | 2006-06-27 | — | — | US | claimed |
| US-6998215-B2 | Negative resist process with simultaneous development and chemical consolidation of resist structures | INFINEON TECHNOLOGIES AG (DE) | 2006-02-14 | — | — | US | claimed |
| US-20030068585-A1 | Chemical consolidation of photoresists in the UV range | POLARIS INNOVATIONS LIMITED (IE) | 2003-04-10 | — | — | US | claimed |
| US-20030064327-A1 | Negative resist process with simultaneous development and chemical consolidation of resist structures | POLARIS INNOVATIONS LIMITED (IE) | 2003-04-03 | — | — | US | claimed |
| EP-3133108-B1 | FIBER-REINFORCED COMPOSITE MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-08-02 | — | — | EP | disclosed |
| CN-109535004-B | Preparation method of N, N, N-trimethyl-1-adamantyl ammonium hydroxide | 上海国瓷新材料技术有限公司 | 2020-03-10 | — | — | CN | disclosed |
| CN-106232692-B | Fiber-reinforced composite material | 三菱瓦斯化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-10233295-B2 | Fiber-reinforced composite material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-3133108-A1 | FIBER-REINFORCED COMPOSITE MATERIAL | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-20170037201-A1 | FIBER-REINFORCED COMPOSITE MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-02-09 | — | — | US | disclosed |
| CN-101935286-A | Method for producing quaternary ammonium salt having adamantyl group | IDEMITSU PETROCHEMICAL CO | 2011-01-05 | — | — | CN | disclosed |
| US-7067234-B2 | Chemical consolidation of photoresists in the UV range | INFINEON TECHNOLOGIES AG (DE) | 2006-06-27 | — | — | US | disclosed |
| US-7045274-B2 | Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification | INFINEON TECHNOLOGIES AG (DE) | 2006-05-16 | — | — | US | disclosed |
| US-6998215-B2 | Negative resist process with simultaneous development and chemical consolidation of resist structures | INFINEON TECHNOLOGIES AG (DE) | 2006-02-14 | — | — | US | disclosed |
| US-6899997-B2 | Process for modifying resist structures and resist films from the aqueous phase | INFINEON TECHNOLOGIES AG (DE) | 2005-05-31 | — | — | US | disclosed |
| US-20030211422-A1 | Process for modifying resist structures and resist films from the aqueous phase | INFINEON TECHNOLOGIES AG (DE) | 2003-11-13 | — | — | US | disclosed |
| US-20030099906-A1 | Process for the aromatization and cycloaliphatization of photoresists in the uv range | POLARIS INNOVATIONS LIMITED (IE) | 2003-05-29 | — | — | US | disclosed |
| US-20030068585-A1 | Chemical consolidation of photoresists in the UV range | POLARIS INNOVATIONS LIMITED (IE) | 2003-04-10 | — | — | US | disclosed |
| US-20030064327-A1 | Negative resist process with simultaneous development and chemical consolidation of resist structures | POLARIS INNOVATIONS LIMITED (IE) | 2003-04-03 | — | — | US | disclosed |