Methacrylic Acid

Methacrylic Acid

SCHEMBL5828781

C=C(C)C(=O)O.OCC1CCC2C3CCC(C3)C12

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1397962 0.83
Acrylic Acid SCHEMBL4059138 0.83 LMNA (0.32)
Crotonic Acid SCHEMBL5827875 0.79
SCHEMBL17583235 0.78
Methacrylic Acid SCHEMBL4123681 0.77 POLB (0.34)
SCHEMBL5828777 0.77 ALDH1A1 (0.45)
SCHEMBL27001585 0.74 CD81 (0.32)
Methacrylic Acid SCHEMBL22418764 0.74 LMNA (0.30)
Methacrylic Acid SCHEMBL4136553 0.73 TGFBR1 (0.32)
SCHEMBL20471157 0.72 CHRM1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113677718-B Radiation curable compositions for rapid prototyping or rapid manufacturing processes 古莎有限公司 2023-12-01 CN claimed
US-7067584-B2 Solvent-containing coating material and the use thereof BASF COATINGS AG (DE) 2006-06-27 US claimed
US-20040019142-A1 Solvent-containing coating material and the use thereof RINK HEINZ-PETER (DE) 2004-01-29 US claimed
CN-113677718-B Radiation curable compositions for rapid prototyping or rapid manufacturing processes 古莎有限公司 2023-12-01 CN disclosed