SCHEMBL582925

SCHEMBL582925

CCCCSCc1cc(C(C)(C)C)c(O)c(C(C)(C)C)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.46
TSHR P16473 3/20 0.46
LMNA P02545 2/20 0.46
GAA P10253 2/20 0.46
GSR P00390 2/20 0.45
KMT2A Q03164 3/20 0.45
MAPK1 P28482 3/20 0.45
MEN1 O00255 2/20 0.45
CYP1A2 P05177 2/20 0.45
CYP3A4 P08684 2/20 0.45
BLM P54132 2/20 0.45
ATM Q13315 2/20 0.45
HIF1A Q16665 2/20 0.45
NPSR1 Q6W5P4 2/20 0.45
ALOX15 P16050 2/20 0.45
GMNN O75496 1/20 0.45
GABBR2 O75899 1/20 0.45
TP53 P04637 1/20 0.45
CYP2C9 P11712 1/20 0.45
NFKB1 P19838 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11808205 0.95 ALDH1A1 (0.47) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL7762345 0.94 ALDH1A1 (0.46) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL9576103 0.94 ALDH1A1 (0.46) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL9653991 0.94 ALDH1A1 (0.46) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL10684907 0.94 ALDH1A1 (0.46) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL1275468 0.91 HSPA5 (0.50) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL9507166 0.88 ALDH1A1 (0.53) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL1275511 0.85 HSPA5 (0.48) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL1274849 0.85 HSPA5 (0.48) ALDH1A1TSHRLMNAGAAGSR
SCHEMBL1275458 0.85 HSPA5 (0.48) ALDH1A1TSHRLMNAGAAGSR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1179555-B1 1:1 Monoadducts from hydroxy(meth)acrylates and diisocyanates having low monomer content and process for their preparation DEGUSSA (DE) 2005-04-27 EP claimed
US-6548696-B2 Useful as starting material for acrylic or isocyanate-functionalized crosslinker, a bonding agent for coatings and adhesives, and a linker for solid-phase synthesis of oligonucleotides, polynucleotides, or peptides DEGUSSA AG (DE) 2003-04-15 US claimed
US-20020049349-A1 Low monomer 1:1-monoadducts from hydroxy (meth) acrylates and diisocyanates and a process for their manufacture DEGUSSA AG (DE) 2002-04-25 US claimed
EP-1179555-A1 1:1 Monoadducts from hydroxy(meth)acrylates and diisocyanates having low monomer content and process for their preparation Degussa AG (DE) 2002-02-13 EP claimed
EP-4547726-A1 SILICONE URETHANE (METH)ACRYLATES AND THEIR USE IN COATING COMPOSITIONS Evonik Operations GmbH (DE) 2025-05-07 EP disclosed
US-12173111-B2 Composition comprising polyesters for additive manufacturing EVONIK OPERATIONS GMBH (DE) 2024-12-24 US disclosed
US-20240101752-A1 SILICONE URETHANE (METH)ACRYLATES AND THEIR USE IN 3D PRINTING RESINS AND COATING COMPOSITIONS EVONIK OPERATIONS GMBH (DE) 2024-03-28 US disclosed
WO-2024002742-A1 SILICONE URETHANE (METH)ACRYLATES AND THEIR USE IN COATING COMPOSITIONS EVONIK OPERATIONS GMBH (DE) 2024-01-04 WO disclosed
EP-4277942-A1 SILICONE URETHANE (METH)ACRYLATES AND THEIR USE IN 3D PRINTING RESINS AND COATING COMPOSITIONS Evonik Operations GmbH (DE) 2023-11-22 EP disclosed
EP-4076959-B1 ADDITIVE MANUFACTURING PROCESS WITH A COMPOSITION COMPRISING POLYESTERS EVONIK OPERATIONS GMBH (DE) 2023-09-27 EP disclosed
CN-116724067-A Silicone urethane (meth) acrylates and their use in 3D printing resins and coating compositions 赢创运营有限公司 2023-09-08 CN disclosed
CN-115943049-A Method of making an additive using a composition comprising a polyester 赢创运营有限公司 2023-04-07 CN disclosed
EP-2367864-A1 LOW MONOMER 1 : 1 MONOADDUCTS OF REACTIVE OLEFINIC COMPOUNDS AND DIISOCYANATES USING INSERTABLE INHIBITORS Evonik Degussa GmbH (DE) 2011-09-28 EP disclosed
WO-2010115644-A1 METHOD FOR PRODUCING 1:1 ADDUCTS HAVING A LOW MONOMER CONTENT FROM HYDROXYALKYL(METH)ACRYLATES AND DIISOCYANATES EVONIK DEGUSSA GMBH (DE) 2010-10-14 WO disclosed
WO-2010072439-A1 LOW MONOMER 1 : 1 MONOADDUCTS OF REACTIVE OLEFINIC COMPOUNDS AND DIISOCYANATES USING INSERTABLE INHIBITORS EVONIK DEGUSSA GMBH (DE) 2010-07-01 WO disclosed
EP-1179555-B1 1:1 Monoadducts from hydroxy(meth)acrylates and diisocyanates having low monomer content and process for their preparation DEGUSSA (DE) 2005-04-27 EP disclosed
US-6548696-B2 Useful as starting material for acrylic or isocyanate-functionalized crosslinker, a bonding agent for coatings and adhesives, and a linker for solid-phase synthesis of oligonucleotides, polynucleotides, or peptides DEGUSSA AG (DE) 2003-04-15 US disclosed
US-20020049349-A1 Low monomer 1:1-monoadducts from hydroxy (meth) acrylates and diisocyanates and a process for their manufacture DEGUSSA AG (DE) 2002-04-25 US disclosed
EP-1179555-A1 1:1 Monoadducts from hydroxy(meth)acrylates and diisocyanates having low monomer content and process for their preparation Degussa AG (DE) 2002-02-13 EP disclosed
US-3960758-A SULFUR-CONTAINING PHENOL BAYER AKTIENGESELLSCHAFT (DT) 1976-06-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020049349-A1 Low monomer 1:1-monoadducts from hydroxy (meth) acrylates and diisocyanates and a process for their manufacture NOS1, PAM, ACP1 ALDH1A1 1560/4885TSHR 2344/4885LMNA 4204/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.