SCHEMBL5829651

SCHEMBL5829651

C=C(C)COCCOC(=O)c1cccc(CC(C)O)c1C(=O)OCCOCC(=C)C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.37
ALDH1A1 P00352 6/20 0.35
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MAPK1 P28482 2/20 0.33
SCN1A P35498 2/20 0.33
SCN2A Q99250 2/20 0.33
SCN3A Q9NY46 2/20 0.33
RECQL P46063 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
LMNA P02545 3/20 0.32
KDM4E B2RXH2 1/20 0.32
HPGD P15428 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
SLC7A5 Q01650 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C9 P11712 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4622177 0.86 TSHR (0.38) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL7081146 0.79 TSHR (0.51) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL815211 0.79 TDP1 (0.38) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL5937395 0.78 TSHR (0.59) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL28104338 0.76 TSHR (0.39) TSHRALDH1A1TDP1L3MBTL1HSD17B10
SCHEMBL3319113 0.74 THRB (0.42) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL29695333 0.74 THRB (0.42) TSHRALDH1A1TDP1L3MBTL1MAPK1
SCHEMBL27510858 0.74 TSHR (0.41) TSHRALDH1A1TDP1MAPK1HSD17B10
SCHEMBL28003242 0.74 CA12 (0.40) TSHRALDH1A1L3MBTL1MAPK1HSD17B10
SCHEMBL4577166 0.73 PRKCG (0.47) TSHRALDH1A1TDP1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100557509-C Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2009-11-04 CN disclosed
CN-100445846-C Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2008-12-24 CN disclosed
US-7101650-B2 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2006-09-05 US disclosed
CN-1766719-A Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2006-05-03 CN disclosed
CN-1766732-A Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO LTD (KR) 2006-05-03 CN disclosed
US-20050042536-A1 Photosensitive resin composition comprising quinonediazide sulfate ester compound DONGJIN SEMICHEM CO. LTD. (KR) 2005-02-24 US disclosed
US-20040248030-A1 Photosensitive resin composition for photoresist DONGJIN SEMICHEM CO., LTD. (KR) 2004-12-09 US disclosed
CN-1543591-A Photosensitive resin composition for photoresist 东进瑟弥侃株式会社 2004-11-03 CN disclosed
WO-2003036388-A1 PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND DONGJIN SEMICHEM CO., LTD. (KR) 2003-05-01 WO disclosed
WO-2003017001-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST DONGJIN SEMICHEM CO., LTD. (KR) 2003-02-27 WO disclosed